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Title: Creating Facets in Photoresist Using Plasma Etch Processing.

Abstract

Abstract not provided.

Authors:
;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1367196
Report Number(s):
SAND2017-5151C
653325
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the American Vacuum Society Spring Symposium held May 15-19, 2017 in Albuquerque, NM, US.
Country of Publication:
United States
Language:
English

Citation Formats

Sovey, Erin Lynn, and Bauer, Todd. Creating Facets in Photoresist Using Plasma Etch Processing.. United States: N. p., 2017. Web.
Sovey, Erin Lynn, & Bauer, Todd. Creating Facets in Photoresist Using Plasma Etch Processing.. United States.
Sovey, Erin Lynn, and Bauer, Todd. Mon . "Creating Facets in Photoresist Using Plasma Etch Processing.". United States. doi:. https://www.osti.gov/servlets/purl/1367196.
@article{osti_1367196,
title = {Creating Facets in Photoresist Using Plasma Etch Processing.},
author = {Sovey, Erin Lynn and Bauer, Todd},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon May 01 00:00:00 EDT 2017},
month = {Mon May 01 00:00:00 EDT 2017}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

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