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Title: Filters for blocking macroparticles in plasma deposition apparatus

Abstract

This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.

Inventors:
;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1364598
Patent Number(s):
9,683,285
Application Number:
14/218,434
Assignee:
The Regents of the University of California LBNL
DOE Contract Number:
AC02-05CH11231
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Mar 18
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Anders, Andre, and Kolbeck, Jonathan. Filters for blocking macroparticles in plasma deposition apparatus. United States: N. p., 2017. Web.
Anders, Andre, & Kolbeck, Jonathan. Filters for blocking macroparticles in plasma deposition apparatus. United States.
Anders, Andre, and Kolbeck, Jonathan. Tue . "Filters for blocking macroparticles in plasma deposition apparatus". United States. doi:. https://www.osti.gov/servlets/purl/1364598.
@article{osti_1364598,
title = {Filters for blocking macroparticles in plasma deposition apparatus},
author = {Anders, Andre and Kolbeck, Jonathan},
abstractNote = {This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 20 00:00:00 EDT 2017},
month = {Tue Jun 20 00:00:00 EDT 2017}
}

Patent:

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