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Title: Intense X-ray and EUV light source

Abstract

An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.

Inventors:
; ;
Publication Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1364402
Patent Number(s):
9,686,844
Application Number:
15/088,366
Assignee:
Los Alamos National Security, LLC LANL
DOE Contract Number:
AC52-06NA25396
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Apr 01
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY

Citation Formats

Coleman, Joshua, Ekdahl, Carl, and Oertel, John. Intense X-ray and EUV light source. United States: N. p., 2017. Web.
Coleman, Joshua, Ekdahl, Carl, & Oertel, John. Intense X-ray and EUV light source. United States.
Coleman, Joshua, Ekdahl, Carl, and Oertel, John. Tue . "Intense X-ray and EUV light source". United States. doi:. https://www.osti.gov/servlets/purl/1364402.
@article{osti_1364402,
title = {Intense X-ray and EUV light source},
author = {Coleman, Joshua and Ekdahl, Carl and Oertel, John},
abstractNote = {An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 20 00:00:00 EDT 2017},
month = {Tue Jun 20 00:00:00 EDT 2017}
}

Patent:

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