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Title: Broad ion energy distributions in helicon wave-coupled helium plasma

Authors:
ORCiD logo [1];  [1];  [1]
  1. Plasma Science and Fusion Center, MIT, 175 Albany St., Cambridge, Massachusetts 02139, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1361886
Grant/Contract Number:
FC02-99ER54512; SC00-02060
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 24; Journal Issue: 5; Related Information: CHORUS Timestamp: 2018-02-14 23:51:55; Journal ID: ISSN 1070-664X
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Woller, K. B., Whyte, D. G., and Wright, G. M.. Broad ion energy distributions in helicon wave-coupled helium plasma. United States: N. p., 2017. Web. doi:10.1063/1.4983315.
Woller, K. B., Whyte, D. G., & Wright, G. M.. Broad ion energy distributions in helicon wave-coupled helium plasma. United States. doi:10.1063/1.4983315.
Woller, K. B., Whyte, D. G., and Wright, G. M.. 2017. "Broad ion energy distributions in helicon wave-coupled helium plasma". United States. doi:10.1063/1.4983315.
@article{osti_1361886,
title = {Broad ion energy distributions in helicon wave-coupled helium plasma},
author = {Woller, K. B. and Whyte, D. G. and Wright, G. M.},
abstractNote = {},
doi = {10.1063/1.4983315},
journal = {Physics of Plasmas},
number = 5,
volume = 24,
place = {United States},
year = 2017,
month = 5
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on May 11, 2018
Publisher's Accepted Manuscript

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  • The characteristics of high-density helicon wave plasma generated in a quartz tube of 10 cm in diameter have been studied. The optimum conditions for efficiently exciting helicon wave plasma have been investigated. It is also observed that plasma fully ionized by helicon waves has ion pumping effect. Whether the discharge is inductive or capacitive, the plasma potential is important, since it determines the energy of the ion incident on the wall. It is investigated theoretically and experimentally that the fluctuation of the plasma potentials influences the ion energy distribution functions monitored by the retarding field energy analyzer. It is alsomore » observed that the plasma potential fluctuates with peak-to-peak voltage {ital V}{sub p{endash}p} in the low-density mode. The radio-frequency modulation to the plasma potential is weaker in the helicon mode than in the low mode. {copyright} {ital 1996 American Institute of Physics.}« less
  • Vector-rf-B-field measurements in the near-field of a helicon plasma source taken throughout the volume of the source are reported. Three distinct modes of operation of the helicon plasma source, capacitive, inductive, and helicon-wave, are identified by the structure of the plasma-wave-fields. Results are reported for a double-half-turn antenna, which is believed to be the first reporting for such an antenna structure in application to helicon-wave plasma sources. Comparison is made to a double-saddle-coil antenna which also demonstrates the distinct inductive and helicon-wave modes. {copyright} {ital 1996 American Institute of Physics.}
  • In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP) and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources duemore » to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple sources for large-area processes.« less
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