Near atomically smooth alkali antimonide photocathode thin films
Journal Article
·
· Journal of Applied Physics
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
Nano-roughness is one of the major factors degrading the emittance of electron beams that can be generated by high efficiency photocathodes, such as the thermally reacted alkali antimonide thin films. In this paper, we demonstrate a co-deposition based method for producing alkali antimonide cathodes that produce near atomic smoothness with high reproducibility. Here, we calculate the effect of the surface roughness on the emittance and show that such smooth cathode surfaces are essential for operation of alkali antimonide cathodes in high field, low emittance radio frequency electron guns and to obtain ultracold electrons for ultrafast electron diffraction applications.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-05CH11231; KC407-ALSJNT-I00103; SC0005713; KC0407-ALSJNT-I0013
- OSTI ID:
- 1379694
- Alternate ID(s):
- OSTI ID: 1361746
- Journal Information:
- Journal of Applied Physics, Vol. 121, Issue 4; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 42 works
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