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Title: From Monochrome to Technicolor: Simple Generic Approaches to Multicomponent Protein Nanopatterning Using Siloxanes with Photoremovable Protein-Resistant Protecting Groups

Abstract

We show that sequential protein deposition is possible by photodeprotection of films formed from a tetraethylene-glycol functionalized nitrophenylethoxycarbonyl-protected aminopropyltriethoxysilane (NPEOC-APTES). Exposure to near-UV irradiation removes the protein-resistant protecting group, and allows protein adsorption onto the resulting aminated surface. The protein resistance was tested using proteins with fluorescent labels and microspectroscopy of two-component structures formed by micro- and nanopatterning and deposition of yellow and green fluorescent proteins (YFP/GFP). Nonspecific adsorption onto regions where the protecting group remained intact was negligible. Multiple component patterns were also formed by near-field methods. Because reading and writing can be decoupled in a near-field microscope, it is possible to carry out sequential patterning steps at a single location involving different proteins. Up to four different proteins were formed into geometric patterns using near-field lithography. Interferometric lithography facilitates the organization of proteins over square cm areas. Two-component patterns consisting of 150 nm streptavidin dots formed within an orthogonal grid of bars of GFP at a period of ca. 500 nm could just be resolved by fluorescence microscopy.

Authors:
 [1];  [1];  [1];  [2];  [2];  [3];  [2]; ORCiD logo [2]; ORCiD logo [3]; ORCiD logo [1]
  1. Univ. of Sheffield (United Kingdom). Dept. of Chemistry
  2. Univ. of Sheffield (United Kingdom). Dept. of Physics and Astronomy
  3. Univ. of Sheffield (United Kingdom). Dept. of Molecular Biology and Biotechnology
Publication Date:
Research Org.:
Washington Univ., St. Louis, MO (United States). Photosynthetic Antenna Research Center (PARC)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22); Engineering and Physical Sciences Research Council (EPSRC); Biotechnology and Biological Sciences Research Council (BBSRC UK)
OSTI Identifier:
1361563
Alternate Identifier(s):
OSTI ID: 1421382
Grant/Contract Number:  
SC0001035
Resource Type:
Journal Article: Published Article
Journal Name:
Langmuir
Additional Journal Information:
Journal Volume: 33; Journal Issue: 35; Journal ID: ISSN 0743-7463
Publisher:
American Chemical Society
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

El Zubir, Osama, Xia, Sijing, Ducker, Robert E., Wang, Lin, Mullin, Nic, Cartron, Michaël L., Cadby, Ashley J., Hobbs, Jamie K., Hunter, C. Neil, and Leggett, Graham J.. From Monochrome to Technicolor: Simple Generic Approaches to Multicomponent Protein Nanopatterning Using Siloxanes with Photoremovable Protein-Resistant Protecting Groups. United States: N. p., 2017. Web. doi:10.1021/acs.langmuir.7b01255.
El Zubir, Osama, Xia, Sijing, Ducker, Robert E., Wang, Lin, Mullin, Nic, Cartron, Michaël L., Cadby, Ashley J., Hobbs, Jamie K., Hunter, C. Neil, & Leggett, Graham J.. From Monochrome to Technicolor: Simple Generic Approaches to Multicomponent Protein Nanopatterning Using Siloxanes with Photoremovable Protein-Resistant Protecting Groups. United States. doi:10.1021/acs.langmuir.7b01255.
El Zubir, Osama, Xia, Sijing, Ducker, Robert E., Wang, Lin, Mullin, Nic, Cartron, Michaël L., Cadby, Ashley J., Hobbs, Jamie K., Hunter, C. Neil, and Leggett, Graham J.. Sat . "From Monochrome to Technicolor: Simple Generic Approaches to Multicomponent Protein Nanopatterning Using Siloxanes with Photoremovable Protein-Resistant Protecting Groups". United States. doi:10.1021/acs.langmuir.7b01255.
@article{osti_1361563,
title = {From Monochrome to Technicolor: Simple Generic Approaches to Multicomponent Protein Nanopatterning Using Siloxanes with Photoremovable Protein-Resistant Protecting Groups},
author = {El Zubir, Osama and Xia, Sijing and Ducker, Robert E. and Wang, Lin and Mullin, Nic and Cartron, Michaël L. and Cadby, Ashley J. and Hobbs, Jamie K. and Hunter, C. Neil and Leggett, Graham J.},
abstractNote = {We show that sequential protein deposition is possible by photodeprotection of films formed from a tetraethylene-glycol functionalized nitrophenylethoxycarbonyl-protected aminopropyltriethoxysilane (NPEOC-APTES). Exposure to near-UV irradiation removes the protein-resistant protecting group, and allows protein adsorption onto the resulting aminated surface. The protein resistance was tested using proteins with fluorescent labels and microspectroscopy of two-component structures formed by micro- and nanopatterning and deposition of yellow and green fluorescent proteins (YFP/GFP). Nonspecific adsorption onto regions where the protecting group remained intact was negligible. Multiple component patterns were also formed by near-field methods. Because reading and writing can be decoupled in a near-field microscope, it is possible to carry out sequential patterning steps at a single location involving different proteins. Up to four different proteins were formed into geometric patterns using near-field lithography. Interferometric lithography facilitates the organization of proteins over square cm areas. Two-component patterns consisting of 150 nm streptavidin dots formed within an orthogonal grid of bars of GFP at a period of ca. 500 nm could just be resolved by fluorescence microscopy.},
doi = {10.1021/acs.langmuir.7b01255},
journal = {Langmuir},
number = 35,
volume = 33,
place = {United States},
year = {Sat May 27 00:00:00 EDT 2017},
month = {Sat May 27 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1021/acs.langmuir.7b01255

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Cited by: 2 works
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