Metal–Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation

Journal Article · Wed Dec 30 00:00:00 EST 2015 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/acsami.5b06901· OSTI ID:1356825

Kung, Chung-Wei; Mondloch, Joseph E.; Wang, Timothy C.; Bury, Wojciech; Hoffeditz, William; Klahr, Benjamin M.; Klet, Rachel C.; Pellin, Michael J.; Farha, Omar K.; Hupp, Joseph T.

Thin films of the metal organic framework (MOP) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States); Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Energy Efficiency and Renewable Energy (EERE)
• DOE Contract Number: AC02-06CH11357; SC0001059
• OSTI ID: 1356825
• Journal Information: ACS Applied Materials and Interfaces, Vol. 7, Issue 51; ISSN 1944-8244
• Publisher: American Chemical Society (ACS)
• Country of Publication: United States
• Language: English

Related Subjects

atomic layer deposition
cobalt oxide
electrocatalyst
metal−organic frameworks
pyrene
water oxidation