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Title: Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films

Abstract

The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. We show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. Furthermore, we illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. These characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures.

Authors:
 [1];  [2];  [3];  [4];  [3];  [5];  [4]
  1. National Dong Hwa Univ., Hualien (Taiwan). Dept. of Materials Science and Engineering
  2. Southern Taiwan Univ. of Science and Technology, Tainan (Taiwan). Dept. of Electro-Optical Engineering
  3. Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies
  4. National Chiao Tung Univ., Tainan (Taiwan). Inst. of Photonic System
  5. Hungkuang Univ., Taichung City (Taiwan). Dept. of Biomedical Engineering
Publication Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE Office of Science (SC). Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1352380
Report Number(s):
LA-UR-17-20908
Journal ID: ISSN 2159-3930
Grant/Contract Number:  
AC52-06NA25396
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Optical Materials Express
Additional Journal Information:
Journal Volume: 7; Journal Issue: 3; Journal ID: ISSN 2159-3930
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Yu, Ing-Song, Cheng, Hsyi-En, Chang, Chun-Chieh, Lin, Yan-Wei, Chen, Hou-Tong, Wang, Yao-Chin, and Yang, Zu-Po. Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films. United States: N. p., 2017. Web. doi:10.1364/OME.7.000777.
Yu, Ing-Song, Cheng, Hsyi-En, Chang, Chun-Chieh, Lin, Yan-Wei, Chen, Hou-Tong, Wang, Yao-Chin, & Yang, Zu-Po. Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films. United States. doi:10.1364/OME.7.000777.
Yu, Ing-Song, Cheng, Hsyi-En, Chang, Chun-Chieh, Lin, Yan-Wei, Chen, Hou-Tong, Wang, Yao-Chin, and Yang, Zu-Po. Mon . "Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films". United States. doi:10.1364/OME.7.000777. https://www.osti.gov/servlets/purl/1352380.
@article{osti_1352380,
title = {Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films},
author = {Yu, Ing-Song and Cheng, Hsyi-En and Chang, Chun-Chieh and Lin, Yan-Wei and Chen, Hou-Tong and Wang, Yao-Chin and Yang, Zu-Po},
abstractNote = {The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. We show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. Furthermore, we illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. These characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures.},
doi = {10.1364/OME.7.000777},
journal = {Optical Materials Express},
number = 3,
volume = 7,
place = {United States},
year = {Mon Feb 06 00:00:00 EST 2017},
month = {Mon Feb 06 00:00:00 EST 2017}
}

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