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Title: Doping control by ALD surface functionalization

Abstract

Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.

Inventors:
;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1350956
Patent Number(s):
8,951,615
Application Number:
13/370,602
Assignee:
UChicago Argonne, LLC (Chicago, IL) ANL
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2012 Feb 10
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Elam, Jeffrey W., and Yanguas-Gil, Angel. Doping control by ALD surface functionalization. United States: N. p., 2015. Web.
Elam, Jeffrey W., & Yanguas-Gil, Angel. Doping control by ALD surface functionalization. United States.
Elam, Jeffrey W., and Yanguas-Gil, Angel. Tue . "Doping control by ALD surface functionalization". United States. doi:. https://www.osti.gov/servlets/purl/1350956.
@article{osti_1350956,
title = {Doping control by ALD surface functionalization},
author = {Elam, Jeffrey W. and Yanguas-Gil, Angel},
abstractNote = {Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 10 00:00:00 EST 2015},
month = {Tue Feb 10 00:00:00 EST 2015}
}

Patent:

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