Current-induced surface roughness reduction in conducting thin films

Du, Lin; Maroudas, Dimitrios

doi:10.1063/1.4977024

Title: Current-induced surface roughness reduction in conducting thin films

Journal Article · Mon Mar 06 00:00:00 EST 2017 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4977024· OSTI ID:1466009

^[1]; Maroudas, Dimitrios ^[1]

Univ. of Massachusetts, Amherst, MA (United States)

Thin film surface roughness is responsible for various materials reliability problems in microelectronics and nanofabrication technologies, which requires the development of surface roughness reduction strategies. Toward this end, we report modeling results that establish the electrical surface treatment of conducting thin films as a physical processing strategy for surface roughness reduction. We develop a continuum model of surface morphological evolution that accounts for the residual stress in the film, surface diffusional anisotropy and film texture, film’s wetting of the layer that is deposited on, and surface electromigration. Supported by linear stability theory, self-consistent dynamical simulations based on the model demonstrate that the action over several hours of a sufficiently strong and properly directed electric field on a conducting thin film can reduce its surface roughness and lead to a smooth planar film surface. In conclusion, the modeling predictions are in agreement with experimental measurements on copper thin films deposited on silicon nitride layers.

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Research Organization:: Univ. of Massachusetts, Amherst, MA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: FG02-07ER46407

OSTI ID:: 1466009

Alternate ID(s):: OSTI ID: 1349360

Journal Information:: Applied Physics Letters, Vol. 110, Issue 10; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 12 works

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Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films Du, Lin; Maroudas, Dimitrios Journal of Applied Physics, Vol. 124, Issue 12 https://doi.org/10.1063/1.5047405	journal	September 2018
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