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Title: Method and system for continuous atomic layer deposition

Abstract

A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.

Inventors:
; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1347583
Patent Number(s):
9,598,769
Application Number:
14/339,058
Assignee:
UCHICAGO ARGONNE, LLC ANL
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Jul 23
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Elam, Jeffrey W., Yanguas-Gil, Angel, and Libera, Joseph A. Method and system for continuous atomic layer deposition. United States: N. p., 2017. Web.
Elam, Jeffrey W., Yanguas-Gil, Angel, & Libera, Joseph A. Method and system for continuous atomic layer deposition. United States.
Elam, Jeffrey W., Yanguas-Gil, Angel, and Libera, Joseph A. Tue . "Method and system for continuous atomic layer deposition". United States. https://www.osti.gov/servlets/purl/1347583.
@article{osti_1347583,
title = {Method and system for continuous atomic layer deposition},
author = {Elam, Jeffrey W. and Yanguas-Gil, Angel and Libera, Joseph A.},
abstractNote = {A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {3}
}

Patent:

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Works referenced in this record:

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
journal, January 2012

  • Poodt, Paul; Cameron, David C.; Dickey, Eric
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 1, Article No. 010802
  • DOI: 10.1116/1.3670745