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Title: Infrared control coating of thin film devices

Patent ·
OSTI ID:1345221
; ;

Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than 200.degree. C.

Research Organization:
ITN ENERGY SYSTEMS, INC., Littleton, CO (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
EE0006348
Assignee:
ITN ENERGY SYSTEMS, INC.
Patent Number(s):
9,581,741
Application Number:
14/293,934
OSTI ID:
1345221
Resource Relation:
Patent File Date: 2014 Jun 02
Country of Publication:
United States
Language:
English

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