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Title: Combining experiment and optical simulation in coherent X-ray nanobeam characterization of Si/SiGe semiconductor heterostructures

Abstract

Here, the highly coherent and tightly focused x-ray beams produced by hard x-ray light sources enable the nanoscale characterization of the structure of electronic materials but are accompanied by significant challenges in the interpretation of diffraction and scattering patterns. X-ray nanobeams exhibit optical coherence combined with a large angular divergence introduced by the x-ray focusing optics. The scattering of nanofocused x-ray beams from intricate semiconductor heterostructures produces a complex distribution of scattered intensity. We report here an extension of coherent xray optical simulations of convergent x-ray beam diffraction patterns to arbitrary x-ray incident angles to allow the nanobeam diffraction patterns of complex heterostructures to be simulated faithfully. These methods are used to extract the misorientation of lattice planes and the strain of individual layers from synchrotron x-ray nanobeam diffraction patterns of Si/SiGe heterostructures relevant to applications in quantum electronic devices. The systematic interpretation of nanobeam diffraction patterns from semiconductor heterostructures presents a new opportunity in characterizing and ultimately designing electronic materials.

Authors:
 [1];  [1];  [1]; ORCiD logo [1];  [1];  [1]; ORCiD logo [1];  [1];  [1];  [1];  [1];  [2]; ORCiD logo [1]
  1. Univ. of Wisconsin, Madison, WI (United States)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States); Univ. of Wisconsin, Madison, WI (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1340989
Alternate Identifier(s):
OSTI ID: 1356344; OSTI ID: 1421259
Grant/Contract Number:  
AC02-06CH11357; FG02-04ER46147; DE‐FG02‐03ER46028
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 120; Journal Issue: 1; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; x-ray nanobeam diffraction; optical simulation; semiconductor heterostructure

Citation Formats

Tilka, J. A., Park, J., Ahn, Y., Pateras, A., Sampson, K. C., Savage, D. E., Prance, J. R., Simmons, C. B., Coppersmith, S. N., Eriksson, M. A., Lagally, M. G., Holt, M. V., and Evans, P. G. Combining experiment and optical simulation in coherent X-ray nanobeam characterization of Si/SiGe semiconductor heterostructures. United States: N. p., 2016. Web. doi:10.1063/1.4955043.
Tilka, J. A., Park, J., Ahn, Y., Pateras, A., Sampson, K. C., Savage, D. E., Prance, J. R., Simmons, C. B., Coppersmith, S. N., Eriksson, M. A., Lagally, M. G., Holt, M. V., & Evans, P. G. Combining experiment and optical simulation in coherent X-ray nanobeam characterization of Si/SiGe semiconductor heterostructures. United States. doi:10.1063/1.4955043.
Tilka, J. A., Park, J., Ahn, Y., Pateras, A., Sampson, K. C., Savage, D. E., Prance, J. R., Simmons, C. B., Coppersmith, S. N., Eriksson, M. A., Lagally, M. G., Holt, M. V., and Evans, P. G. Wed . "Combining experiment and optical simulation in coherent X-ray nanobeam characterization of Si/SiGe semiconductor heterostructures". United States. doi:10.1063/1.4955043. https://www.osti.gov/servlets/purl/1340989.
@article{osti_1340989,
title = {Combining experiment and optical simulation in coherent X-ray nanobeam characterization of Si/SiGe semiconductor heterostructures},
author = {Tilka, J. A. and Park, J. and Ahn, Y. and Pateras, A. and Sampson, K. C. and Savage, D. E. and Prance, J. R. and Simmons, C. B. and Coppersmith, S. N. and Eriksson, M. A. and Lagally, M. G. and Holt, M. V. and Evans, P. G.},
abstractNote = {Here, the highly coherent and tightly focused x-ray beams produced by hard x-ray light sources enable the nanoscale characterization of the structure of electronic materials but are accompanied by significant challenges in the interpretation of diffraction and scattering patterns. X-ray nanobeams exhibit optical coherence combined with a large angular divergence introduced by the x-ray focusing optics. The scattering of nanofocused x-ray beams from intricate semiconductor heterostructures produces a complex distribution of scattered intensity. We report here an extension of coherent xray optical simulations of convergent x-ray beam diffraction patterns to arbitrary x-ray incident angles to allow the nanobeam diffraction patterns of complex heterostructures to be simulated faithfully. These methods are used to extract the misorientation of lattice planes and the strain of individual layers from synchrotron x-ray nanobeam diffraction patterns of Si/SiGe heterostructures relevant to applications in quantum electronic devices. The systematic interpretation of nanobeam diffraction patterns from semiconductor heterostructures presents a new opportunity in characterizing and ultimately designing electronic materials.},
doi = {10.1063/1.4955043},
journal = {Journal of Applied Physics},
number = 1,
volume = 120,
place = {United States},
year = {Wed Jul 06 00:00:00 EDT 2016},
month = {Wed Jul 06 00:00:00 EDT 2016}
}

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