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Title: Nanoscale self-templating for oxide epitaxy with large symmetry mismatch

Abstract

Direct observations using scanning transmission electron microscopy unveil an intriguing interfacial bi-layer that enables epitaxial growth of a strain-free, monoclinic, bronze-phase VO 2(B) thin film on a perovskite SrTiO 3 (STO) substrate. For this study, we observe an ultrathin (2–3 unit cells) interlayer best described as highly strained VO 2(B) nanodomains combined with an extra (Ti,V)O 2 layer on the TiO 2 terminated STO (001) surface. By forming a fully coherent interface with the STO substrate and a semi-coherent interface with the strain-free epitaxial VO 2(B) film above, the interfacial bi-layer enables the epitaxial connection of the two materials despite their large symmetry and lattice mismatch.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1339379
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Scientific Reports
Additional Journal Information:
Journal Volume: 6; Journal ID: ISSN 2045-2322
Publisher:
Nature Publishing Group
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Batteries; Structural properties

Citation Formats

Gao, Xiang, Lee, Shinbuhm, Nichols, John A., Meyer, Tricia L., Ward, Thomas Zac, Chisholm, Matthew F., and Lee, Ho Nyung. Nanoscale self-templating for oxide epitaxy with large symmetry mismatch. United States: N. p., 2016. Web. doi:10.1038/srep38168.
Gao, Xiang, Lee, Shinbuhm, Nichols, John A., Meyer, Tricia L., Ward, Thomas Zac, Chisholm, Matthew F., & Lee, Ho Nyung. Nanoscale self-templating for oxide epitaxy with large symmetry mismatch. United States. doi:10.1038/srep38168.
Gao, Xiang, Lee, Shinbuhm, Nichols, John A., Meyer, Tricia L., Ward, Thomas Zac, Chisholm, Matthew F., and Lee, Ho Nyung. Fri . "Nanoscale self-templating for oxide epitaxy with large symmetry mismatch". United States. doi:10.1038/srep38168. https://www.osti.gov/servlets/purl/1339379.
@article{osti_1339379,
title = {Nanoscale self-templating for oxide epitaxy with large symmetry mismatch},
author = {Gao, Xiang and Lee, Shinbuhm and Nichols, John A. and Meyer, Tricia L. and Ward, Thomas Zac and Chisholm, Matthew F. and Lee, Ho Nyung},
abstractNote = {Direct observations using scanning transmission electron microscopy unveil an intriguing interfacial bi-layer that enables epitaxial growth of a strain-free, monoclinic, bronze-phase VO2(B) thin film on a perovskite SrTiO3 (STO) substrate. For this study, we observe an ultrathin (2–3 unit cells) interlayer best described as highly strained VO2(B) nanodomains combined with an extra (Ti,V)O2 layer on the TiO2 terminated STO (001) surface. By forming a fully coherent interface with the STO substrate and a semi-coherent interface with the strain-free epitaxial VO2(B) film above, the interfacial bi-layer enables the epitaxial connection of the two materials despite their large symmetry and lattice mismatch.},
doi = {10.1038/srep38168},
journal = {Scientific Reports},
issn = {2045-2322},
number = ,
volume = 6,
place = {United States},
year = {2016},
month = {12}
}

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