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Title: Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Authors:
; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1338662
Grant/Contract Number:  
SC0001304
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 118; Journal Issue: 2; Related Information: CHORUS Timestamp: 2017-01-10 10:13:41; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., and Yang, F. Y. Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films. United States: N. p., 2017. Web. doi:10.1103/PhysRevLett.118.027201.
Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., & Yang, F. Y. Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films. United States. doi:10.1103/PhysRevLett.118.027201.
Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., and Yang, F. Y. Mon . "Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films". United States. doi:10.1103/PhysRevLett.118.027201.
@article{osti_1338662,
title = {Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films},
author = {Gallagher, J. C. and Meng, K. Y. and Brangham, J. T. and Wang, H. L. and Esser, B. D. and McComb, D. W. and Yang, F. Y.},
abstractNote = {},
doi = {10.1103/PhysRevLett.118.027201},
journal = {Physical Review Letters},
number = 2,
volume = 118,
place = {United States},
year = {Mon Jan 09 00:00:00 EST 2017},
month = {Mon Jan 09 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1103/PhysRevLett.118.027201

Citation Metrics:
Cited by: 8 works
Citation information provided by
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