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Title: Mechanical Design of Thin-film Diamond Crystal Mounting Apparatus for Coherence Preservation Hard X-ray Optics

Authors:
; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1336954
DOE Contract Number:
AC02-06CH11357
Resource Type:
Conference
Resource Relation:
Conference: 12th International Conference on Synchrotron Radiation Instrumentation , 07/06/15 - 07/10/15, New York, NY
Country of Publication:
United States
Language:
English
Subject:
Crystal mounting; Hard x-ray optics

Citation Formats

Shu, Deming, Shvydko, Yuri, Stoupin, Stanislav, and Kim, Kwang-Je. Mechanical Design of Thin-film Diamond Crystal Mounting Apparatus for Coherence Preservation Hard X-ray Optics. United States: N. p., 2016. Web. doi:10.1063/1.4952839.
Shu, Deming, Shvydko, Yuri, Stoupin, Stanislav, & Kim, Kwang-Je. Mechanical Design of Thin-film Diamond Crystal Mounting Apparatus for Coherence Preservation Hard X-ray Optics. United States. doi:10.1063/1.4952839.
Shu, Deming, Shvydko, Yuri, Stoupin, Stanislav, and Kim, Kwang-Je. 2016. "Mechanical Design of Thin-film Diamond Crystal Mounting Apparatus for Coherence Preservation Hard X-ray Optics". United States. doi:10.1063/1.4952839.
@article{osti_1336954,
title = {Mechanical Design of Thin-film Diamond Crystal Mounting Apparatus for Coherence Preservation Hard X-ray Optics},
author = {Shu, Deming and Shvydko, Yuri and Stoupin, Stanislav and Kim, Kwang-Je},
abstractNote = {},
doi = {10.1063/1.4952839},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2016,
month = 7
}

Conference:
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  • A new thin-film diamond crystal mounting apparatus has been designed at the Advanced Photon Source (APS) for coherence preservation hard x-ray optics with optimized thermal contact and minimized crystal strain. This novel mechanical design can be applied to new development in the field of: x-ray optics cavities for hard x-ray free-electron laser oscillators (XFELOs), self-seeding monochromators for hard x-ray free-electron laser (XFEL) with high average thermal loading, high heat load diamond crystal monochromators and beam-sharing/beam-split-and-delay devices for XFEL facilities and future upgraded high-brightness coherent x-ray source in the MBA lattice configuration at the APS.
  • Customized flexure mechanisms and precision thermal expansion compensation are needed for the development of nanopositioning stages for hard x-ray nanofocusing and coherence preservation optics at the APS. Recent progress of such stage development is summarized in this paper, which includes: stages designed for alignment apparatus for K-B mirrors with 20 - 50 nm focal spot; alignment apparatus for six Fresnel zone plates stacking with 20 nm focal spot; stages for switchable multiple nanofocusing system; UHV hard x-ray monochromators for coherence related applications; and four-crystal hard x-ray split-and-delay line with coherence preservation. Preliminary test results for mechanical performance of these nanopositioningmore » stages are also discussed in this paper.« less
  • Single and polycrystal diamond thin films were etched in a 2.45 GHz microwave plasma system under electron cyclotron resonance (ECR) conditions, in pure oxygen plasma. A very intense (high mode) plasma was observed when the critical ECR field (875 Gauss) was at the microwave window and the magnetic field gradient was increasing away from the window. Because of the flexibility of moving magnetic coils along the length of the chamber, it was possible to establish high mode plasma conditions. Langmuir probe measurements of this high mode plasma showed that the ion current density was more than four times that ofmore » the normal mode. Under high mode plasma conditions, reproducible high diamond etching rates were achieved, up to 300 nm/min, for microwave power of 300 Watts and pressures of 3 mTorr of pure oxygen. SEM observations of etched samples revealed smooth surfaces with high uniformity.« less
  • High-peak-power, short-pulse laser systems require specialized thin-film coatings, primarily due to laser damage thresholds and increased spectral bandwidth. The influence of these effects is evident in wavefront performance, coating thickness, and design complexity.
  • Abstract not provided.