Effectiveness of BaTiO3 dielectric patches on YBa2Cu3O7 thin films for MEM switches
- Univ. of Turabo, Gurabo (Puerto Rico). Dept. of Electrical Engineering
- Univ. of Engineering and Techology, Lima (Peru). Dept. of Electrical Engineering
- Florida Intl Univ., Miami, FL (United States). Dept. of Electrical Engineering
A micro-electro-mechanical (MEM) switch built on a superconducting microstrip filter will be utilized to investigate BaTiO3 dielectric patches for functional switching points of contact. Actuation voltage resulting from the MEM switch provokes static friction between the bridge membrane and BaTiO3 insulation layer. Furthermore, the dielectric patch crystal structure and roughness affect the ability of repetitively switching cycles and lifetime. We performed a series of experiments using different deposition methods and RF magnetron sputtering was found to be the best deposition process for the BaTiO3 layer. The effect examination of surface morphology will be presented using characterization techniques as x-ray diffraction, SEM and AFM for an optimum switching device. The thin film is made of YBa2Cu3O7 deposited on LaAlO3 substrate by pulsed laser deposition. In our work, the dielectric material sputtering pressure is set at 9.5x10-6 Torr. The argon gas is released through a mass-flow controller to purge the system prior to deposition. RF power is 85 W at a distance of 9 cm. The behavior of Au membranes built on ultimate BaTiO3 patches will be shown as part of the results. These novel surface patterns will in turn be used in modelling other RF MEM switch devices such as distributed-satellite communication system operating at cryogenic temperatures.
- Research Organization:
- Univ. of Turabo, Gurabo (Puerto Rico)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); US Air Force Office of Scientific Research (AFOSR)
- Grant/Contract Number:
- NA0000672
- OSTI ID:
- 1336562
- Journal Information:
- Journal of Physics. Conference Series (Online), Vol. 507, Issue 4; ISSN 1742-6596
- Publisher:
- Institute of Physics (IOP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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