Secondary electron emission from plasma-generated nanostructured tungsten fuzz

Patino, M.; Raitses, Y.; Wirz, R.

doi:10.1063/1.4967830

Title: Secondary electron emission from plasma-generated nanostructured tungsten fuzz

Journal Article · Mon Nov 14 00:00:00 EST 2016 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4967830· OSTI ID:1335459

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Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States); Univ. of California, Los Angeles, CA (United States)
Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
Univ. of California, Los Angeles, CA (United States)

Recently, several researchers (e.g., Q. Yang, Y.-W. You, L. Liu, H. Fan, W. Ni, D. Liu, C. S. Liu, G. Benstetter, and Y. Wang, Scientific Reports 5, 10959 (2015)) have shown that tungsten fuzz can grow on a hot tungsten surface under bombardment by energetic helium ions in different plasma discharges and applications, including magnetic fusion devices with plasma facing tungsten components. This work reports direct measurements of the total effective secondary electron emission (SEE) from tungsten fuzz. Using dedicated material surface diagnostics and in-situ characterization, we find two important results: (1) SEE values for tungsten fuzz are 40-63% lower than for smooth tungsten and (2) the SEE values for tungsten fuzz are independent of the angle of the incident electron. The reduction in SEE from tungsten fuzz is most pronounced at high incident angles, which has important implications for many plasma devices since in a negative-going sheath the potential structure leads to relatively high incident angles for the electrons at the plasma confining walls. Overall, low SEE will create a relatively higher sheath potential difference that reduces plasma electron energy loss to the confining wall. Thus the presence or self-generation in a plasma of a low SEE surface such as tungsten fuzz can be desirable for improved performance of many plasma devices.:7px

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Research Organization:: Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-09CH11466; AF9550-09-1-0695; FA9550-11-1-0282; FA9550-14-1-0053; FA9550-14-10317

OSTI ID:: 1335459

Alternate ID(s):: OSTI ID: 1332367

Journal Information:: Applied Physics Letters, Vol. 109, Issue 20; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 46 works

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