Large-Area Lithography-Free Metamaterial Thermophotovoltaic Emitters with Oxygen Tolerance
- Vanderbilt University, Nashville
- ORNL
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1334490
- Resource Relation:
- Conference: Laser Science, Rochester, NY, USA, 20161017, 20161021
- Country of Publication:
- United States
- Language:
- English
Similar Records
Lithography-free large-area metamaterials for stable thermophotovoltaic energy conversion
Proximity Field Nanopatterning Lithography for Large Area 3D Photonic Nano-Structures: Forward and Inverse Problem Modeling.
Large Area Projection Micro Stereo Lithography (LAPµSL) III Systems Engineering review.
Journal Article
·
Mon Feb 08 00:00:00 EST 2016
· Advanced Optical Materials
·
OSTI ID:1334490
Proximity Field Nanopatterning Lithography for Large Area 3D Photonic Nano-Structures: Forward and Inverse Problem Modeling.
Conference
·
Sun Apr 01 00:00:00 EDT 2007
·
OSTI ID:1334490
+5 more
Large Area Projection Micro Stereo Lithography (LAPµSL) III Systems Engineering review.
Conference
·
Tue Jan 31 00:00:00 EST 2017
·
OSTI ID:1334490