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Title: Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

Journal Article · · Journal of Materials Research
DOI:https://doi.org/10.1557/jmr.2015.140· OSTI ID:1334193

Recent efforts have demonstrated enhanced tailoring of material functionality with mixed-anion materials, yet exploratory research with mixed-anion chemistries is limited by the sensitivity of these materials to synthesis conditions. In order to synthesize a particular metal oxynitride compound by traditional reactive annealing we require specific, limited ranges of both oxygen and nitrogen chemical potentials in order to establish equilibrium between the solid-state material and a reactive atmosphere. While using Ta-O-N as an example system, we describe a combination of reactive sputter deposition and rapid thermal processing for synthesis of mixed-anion inorganic materials. Heuristic optimization of reactive gas pressures to attain a desired anion stoichiometry is discussed, and the ability of rapid thermal processing to enable amorphous to crystalline transitions without preferential anion loss is demonstrated through the controlled synthesis of nitride, oxide and oxynitride phases.

Research Organization:
California Institute of Technology (CalTech), Pasadena, CA (United States). Joint Center for Artificial Photosynthesis (JCAP)
Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0004993
OSTI ID:
1334193
Journal Information:
Journal of Materials Research, Vol. 30, Issue 19; ISSN 0884-2914
Publisher:
Materials Research SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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Cited By (3)

Tracking materials science data lineage to manage millions of materials experiments and analyses journal July 2019
Defect Engineering for Photocatalysis: From Ternary to Perovskite Oxynitrides journal February 2020
$ \newcommand{\bt}{\beta} \bt$ -TaON thin films: production by reactive magnetron sputtering and the question of non-stoichiometry journal May 2019