Methods for dry etching semiconductor devices

Bauer, Todd; Gross, Andrew John; Clews, Peggy J.; Olsson, Roy H.

Title: Methods for dry etching semiconductor devices

Patent · Tue Nov 01 00:00:00 EDT 2016

OSTI ID:1330708

Bauer, Todd; Gross, Andrew John; Clews, Peggy J.; Olsson, Roy H.

The present invention provides methods for etching semiconductor devices, such aluminum nitride resonators. The methods herein allow for devices having improved etch profiles, such that nearly vertical sidewalls can be obtained. In some examples, the method employs a dry etch step with a primary etchant gas that omits BCl.sub.3, a common additive.

View Patent

Cite

Export

Save

Research Organization:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Number(s):: 9,484,216

Application Number:: 14/728,810

OSTI ID:: 1330708

Resource Relation:: Patent File Date: 2015 Jun 02

Country of Publication:: United States

Language:: English

References (37)

Device fabrication by plasma etching Levinstein, Hyman J.; Wang, David N. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/4256534 US Patent Document 4,256,534	patent	March 1981
Dry etching method for compound semiconductors Shul, Randy J.; Constantine, Christopher https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5624529 US Patent Document 5,624,529	patent	April 1997
Method of dry plasma etching semiconductor materials Wang, Jennifer https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7081415 US Patent Document 7,081,415	patent	July 2006
Method for etching smooth sidewalls in III-V based compounds for electro-optical devices Mirkarimi, Laura Wills; Chow, Kai https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7196017 US Patent Document 7,196,017	patent	March 2007
Contour mode resonators with acoustic reflectors Olsson, Roy H.; Fleming, James G.; Tuck, Melanie R. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7385334 US Patent Document 7,385,334	patent	June 2008
IC-compatible MEMS structure Quevy, Emmanuel P. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7514760 US Patent Document 7,514,760	patent	April 2009
Microelectromechanical resonator and method for fabrication Wittwer, Jonathan W.; Olsson, Roy H. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7652547 US Patent Document 7,652,547	patent	January 2010
Method for fabricating a microelectromechanical resonator Wojciechowski, Kenneth; Olsson, Roy H. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8367305 US Patent Document 8,367,305	patent	February 2013
Microelectromechanical filter formed from parallel-connected lattice networks of contour-mode resonators Wojciechowski, Kenneth; Olsson, Roy H.; Ziaei-Moayyed, Maryam https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8497747 US Patent Document 8,497,747	patent	July 2013
Method to control BAW resonator top electrode edge during patterning Bouche, Guillaume; Wall, Ralph N. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8522411 US Patent Document 8,522,411	patent	September 2013
Ovenized microelectromechanical system (MEMS) resonator Olsson, Roy H.; Wojciechowski, Kenneth; Kim, Bongsang https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8669823 US Patent Document 8,669,823	patent	March 2014
MEMS in RF Filter Applications: Thin-film Bulk Acoustic Wave Technology Aigner, R. Sensors Update, Vol. 12, Issue 1, p. 175-210 https://doi.org/10.1002/seup.200390006	journal	February 2003
A new wafer-level packaging technology for MEMS with hermetic micro-environment Chanchani, Rajen; Nordquist, Christopher D.; Olsson, Roy H. 2011 IEEE 61st Electronic Components and Technology Conference (ECTC) https://doi.org/10.1109/ECTC.2011.5898725	conference	May 2011
Single-crystal aluminum nitride nanomechanical resonators Cleland, A. N.; Pophristic, M.; Ferguson, I. Applied Physics Letters, Vol. 79, Issue 13 https://doi.org/10.1063/1.1396633	journal	September 2001
Plasma Etching of Aluminum Danner, D. A. Journal of The Electrochemical Society, Vol. 134, Issue 3 https://doi.org/10.1149/1.2100529	journal	January 1987
Plasma etching: Yesterday, today, and tomorrow Donnelly, Vincent M.; Kornblit, Avinoam Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 31, Issue 5 https://doi.org/10.1116/1.4819316	journal	September 2013
Aluminum nitride piezo-acousto-photonic crystal nanocavity with high quality factors Fan, Linran; Sun, Xiankai; Xiong, Chi Applied Physics Letters, Vol. 102, Issue 15 https://doi.org/10.1063/1.4802250	journal	April 2013
Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN Hahn, Y. B.; Hays, D. C.; Donovan, S. M. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, Issue 3 https://doi.org/10.1116/1.581647	journal	May 1999
Frequency Trimming of Aluminum Nitride Microresonators Using Rapid Thermal Annealing Henry, Michael David; Nguyen, Janet; Young, Travis Ryan Journal of Microelectromechanical Systems, Vol. 23, Issue 3 https://doi.org/10.1109/JMEMS.2013.2283801	journal	June 2014
Hermetic wafer-level packaging for RF MEMs: Effects on resonator performance Henry, M. David; Greth, K. Douglas; Nguyen, Janet 2012 IEEE 62nd Electronic Components and Technology Conference https://doi.org/10.1109/ECTC.2012.6248856	conference	May 2012
High-frequency lamb wave device composed of MEMS structure using LiNbO ₃ thin film and air gap Kadota, M; Ogami, T; Yamamoto, K IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, Vol. 57, Issue 11, p. 2564-2571 https://doi.org/10.1109/TUFFC.2010.1722	journal	November 2010
AlN Microresonator-Based Filters With Multiple Bandwidths at Low Intermediate Frequencies Kim, Bongsang; Olsson, Roy H.; Wojciechowski, Ken E. Journal of Microelectromechanical Systems, Vol. 22, Issue 4, p. 949-961 https://doi.org/10.1109/JMEMS.2013.2251414	journal	August 2013
Capacitive frequency tuning of ALN micromechanical resonators Kim, B.; Olsson, R. H.; Wojciechowski, K. E. TRANSDUCERS 2011 - 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference https://doi.org/10.1109/TRANSDUCERS.2011.5969665	conference	June 2011
Ovenized and thermally tunable aluminum nitride microresonators Kim, Bongsang; Olsson, Roy H.; Wojciechowski, Kenneth E. 2010 IEEE International Ultrasonics Symposium https://doi.org/10.1109/ULTSYM.2010.5935635	conference	October 2010
SAW/BAW acoustoelectronic technology for filters and communication systems Malocha, D. C. 2010 IEEE 11th Annual Wireless and Microwave Technology Conference (WAMICON) https://doi.org/10.1109/WAMICON.2010.5461848	conference	April 2010
Sputtered thin film piezoelectric aluminum nitride as a functional MEMS material Marauska, S.; Hrkac, V.; Dankwort, T. Microsystem Technologies, Vol. 18, Issue 6 https://doi.org/10.1007/s00542-012-1493-1	journal	March 2012
On/Off micro-electromechanical switching of AlN piezoelectric resonators Nordquist, Christopher D.; Olsson, Roy H.; Scott, Sean. M. 2013 IEEE/MTT-S International Microwave Symposium - MTT 2013, 2013 IEEE MTT-S International Microwave Symposium Digest (MTT) https://doi.org/10.1109/MWSYM.2013.6697719	conference	June 2013
A high electromechanical coupling coefficient SH0 Lamb wave lithium niobate micromechanical resonator and a method for fabrication Olsson, Roy H.; Hattar, Khalid; Homeijer, Sara J. Sensors and Actuators A: Physical, Vol. 209, p. 183-190 https://doi.org/10.1016/j.sna.2014.01.033	journal	March 2014
Post-CMOS Compatible Aluminum Nitride MEMS Filters and Resonant Sensors Olsson, Roy H.; Fleming, James G.; Wojciechowski, Kenneth E. 2007 IEEE International Frequency Control Symposium Joint with the 21st European Frequency and Time Forum https://doi.org/10.1109/FREQ.2007.4319108	conference	May 2007
Post-CMOS-Compatible Aluminum Nitride Resonant MEMS Accelerometers Olsson, R. H.; Wojciechowski, K. E.; Baker, M. S. Journal of Microelectromechanical Systems, Vol. 18, Issue 3 https://doi.org/10.1109/JMEMS.2009.2020374	journal	June 2009
High-Q aluminum nitride photonic crystal nanobeam cavities Pernice, W. H. P.; Xiong, C.; Schuck, C. Applied Physics Letters, Vol. 100, Issue 9 https://doi.org/10.1063/1.3690888	journal	February 2012
Piezoelectric aluminum nitride thin films for microelectromechanical systems Piazza, Gianluca; Felmetsger, Valeriy; Muralt, Paul MRS Bulletin, Vol. 37, Issue 11, p. 1051-1061 https://doi.org/10.1557/mrs.2012.268	journal	November 2012
Thin-film Lithium Niobate contour-mode resonators Wang, Renyuan; Bhave, Sunil A.; Bhattacharjee, Kushal Ultrasonics Symposium (IUS), 2012 IEEE International https://doi.org/10.1109/ULTSYM.2012.0074	conference	October 2012
Single-chip precision oscillators based on multi-frequency, high-Q aluminum nitride MEMS resonators Wojciechowski, K. E.; Olsson, R. H.; Tuck, M. R. Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International https://doi.org/10.1109/SENSOR.2009.5285626	conference	June 2009
Super high frequency width extensional aluminum nitride (AlN) MEMS resonators Wojciechowski, K. E.; Olsson, R. H.; Nordquist, C. D. 2009 IEEE International Ultrasonics Symposium https://doi.org/10.1109/ULTSYM.2009.5441802	conference	September 2009
Low-Loss, Silicon Integrated, Aluminum Nitride Photonic Circuits and Their Use for Electro-Optic Signal Processing Xiong, Chi; Pernice, Wolfram H. P.; Tang, Hong X. Nano Letters, Vol. 12, Issue 7 https://doi.org/10.1021/nl3011885	journal	June 2012
Researching the Aluminum Nitride Etching Process for Application in MEMS Resonators Yang, Jian; Si, Chaowei; Han, Guowei Micromachines, Vol. 6, Issue 2 https://doi.org/10.3390/mi6020281	journal	February 2015

Similar Records

Dry etching method for compound semiconductors

Patent · Tue Apr 29 00:00:00 EDT 1997 · OSTI ID:1330708

Shul, R J; Constantine, C

Dry etching method for compound semiconductors

Patent · Wed Jan 01 00:00:00 EST 1997 · OSTI ID:1330708

Shul, Randy J; Constantine, Christopher

Microfabrication of membrane-based devices by HARSE and combined HARSE/wet etching

Conference · Sat Aug 01 00:00:00 EDT 1998 · OSTI ID:1330708

Manginell, R P; Frye-Mason, G C; Schubert, W K; +2 more

Related Subjects

36 MATERIALS SCIENCE

Title: Methods for dry etching semiconductor devices

Citation Formats

References (37)

Similar Records

Related Subjects