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Title: Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1326242
Grant/Contract Number:
AC02-06CH11357
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Nanotechnology
Additional Journal Information:
Journal Volume: 27; Journal Issue: 43; Related Information: CHORUS Timestamp: 2016-09-23 04:16:07; Journal ID: ISSN 0957-4484
Publisher:
IOP Publishing
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Ren, J., Ocola, L. E., Divan, R., Czaplewski, D. A., Segal-Peretz, T., Xiong, S., Kline, R. J., Arges, C. G., and Nealey, P. F.. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. United Kingdom: N. p., 2016. Web. doi:10.1088/0957-4484/27/43/435303.
Ren, J., Ocola, L. E., Divan, R., Czaplewski, D. A., Segal-Peretz, T., Xiong, S., Kline, R. J., Arges, C. G., & Nealey, P. F.. Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures. United Kingdom. doi:10.1088/0957-4484/27/43/435303.
Ren, J., Ocola, L. E., Divan, R., Czaplewski, D. A., Segal-Peretz, T., Xiong, S., Kline, R. J., Arges, C. G., and Nealey, P. F.. Fri . "Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures". United Kingdom. doi:10.1088/0957-4484/27/43/435303.
@article{osti_1326242,
title = {Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures},
author = {Ren, J. and Ocola, L. E. and Divan, R. and Czaplewski, D. A. and Segal-Peretz, T. and Xiong, S. and Kline, R. J. and Arges, C. G. and Nealey, P. F.},
abstractNote = {},
doi = {10.1088/0957-4484/27/43/435303},
journal = {Nanotechnology},
number = 43,
volume = 27,
place = {United Kingdom},
year = {Fri Sep 23 00:00:00 EDT 2016},
month = {Fri Sep 23 00:00:00 EDT 2016}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1088/0957-4484/27/43/435303

Citation Metrics:
Cited by: 6works
Citation information provided by
Web of Science

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  • Epitaxy is a widely used method to grow high-quality crystals. One of the key challenges in the field of inorganic solids is the development of epitaxial single-crystal nanostructures. We describe their formation from block copolymer self-assembly–directed nanoporous templates on single-crystal Si backfilled with Si or NiSi through a laser-induced transient melt process. Depending on thickness, template removal leaves either an array of nanopillars or porous nanostructures behind. For stoichiometric NiSi deposition, the template pores provide confinement, enabling heteroepitaxial growth. Irradiation through a mask provides access to hierarchically structured materials. These results on etchable and non-etchable materials suggest a general strategymore » for growing epitaxial single-crystal nanostructured thin films for fundamental studies and a wide variety of applications, including energy conversion and storage.« less
  • Chemical patterns for directed self-assembly (DSA) of lamellaeforming block copolymers (BCP) with density multiplication can be fabricated by patterning resist on a cross-linked polystyrene layer, etching to create guide stripes, and depositing end-grafted brushes in between the stripes as background. To date, two-tone chemical patterns have been targeted with the guide stripes preferentially wet by one block of the copolymer and the background chemistry weakly preferentially wet by the other block. In the course of fabricating chemical patterns in an all-track process using 300 mm wafers, it was discovered that the etching process followed by brush grafting could produce amore » three-tone pattern. We characterized the three regions of the chemical patterns with a combination of SEM, grazing-incidence small-angle X-ray scattering (GISAXS), and assessment of BCP-wetting behavior, and evaluated the DSA behavior on patterns over a range of guide stripe widths. In its best form, the three-tone pattern consists of guide stripes preferentially wet by one block of the copolymer, each flanked by two additional stripes that wet the other block of the copolymer, with a third chemistry as the background. Three-tone patterns guide three times as many BCP domains as two-tone patterns and thus have the potential to provide a larger driving force for the system to assemble into the desired architecture with fewer defects in shorter time and over a larger process window.« less