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Title: Low temperature deep reactive ion etching :

Abstract

Abstract not provided.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1288865
Report Number(s):
SAND2011-3530C
480502
DOE Contract Number:
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the NMAVS Conference held May 24, 2011 in Albuquerque, NM.
Country of Publication:
United States
Language:
English

Citation Formats

Fishgrab, Kira L, Young, Travis Ryan, Wiwi, Michael, Shul, Randy John, and Clevenger, Jascinda. Low temperature deep reactive ion etching :. United States: N. p., 2011. Web.
Fishgrab, Kira L, Young, Travis Ryan, Wiwi, Michael, Shul, Randy John, & Clevenger, Jascinda. Low temperature deep reactive ion etching :. United States.
Fishgrab, Kira L, Young, Travis Ryan, Wiwi, Michael, Shul, Randy John, and Clevenger, Jascinda. Sun . "Low temperature deep reactive ion etching :". United States. doi:. https://www.osti.gov/servlets/purl/1288865.
@article{osti_1288865,
title = {Low temperature deep reactive ion etching :},
author = {Fishgrab, Kira L and Young, Travis Ryan and Wiwi, Michael and Shul, Randy John and Clevenger, Jascinda},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sun May 01 00:00:00 EDT 2011},
month = {Sun May 01 00:00:00 EDT 2011}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

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