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Title: Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography

Abstract

Magnetic nanoparticles produced via nanoimprint lithography can change the current paradigm of fabrication processes from chemical “bottom-up” synthesis to “top-down” fabrication. The combination of controlled nondirectional magnetron sputtering, ETFE mold, bilayer lift-off, and dry etching release can control the shape, size, and structure of the fabricated nanoparticles. The resulting magnetic nanoparticles have a novel “sombrero” shape with complex and unique physical/magnetic properties.

Authors:
 [1];  [2];  [1];  [1]
  1. Department of Materials Science and Engineering, University of Washington, Seattle WA 98195 USA
  2. Argonne National Laboratory, Lemont IL 60439 USA
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences and Engineering Division
OSTI Identifier:
1287491
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Resource Relation:
Journal Name: Advanced Materials Interfaces; Journal Volume: 2; Journal Issue: 3
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Kwon, Byung Seok, Zhang, Wei, Li, Zheng, and Krishnan, Kannan M. Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography. United States: N. p., 2015. Web. doi:10.1002/admi.201400511.
Kwon, Byung Seok, Zhang, Wei, Li, Zheng, & Krishnan, Kannan M. Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography. United States. doi:10.1002/admi.201400511.
Kwon, Byung Seok, Zhang, Wei, Li, Zheng, and Krishnan, Kannan M. Sat . "Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography". United States. doi:10.1002/admi.201400511.
@article{osti_1287491,
title = {Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography},
author = {Kwon, Byung Seok and Zhang, Wei and Li, Zheng and Krishnan, Kannan M.},
abstractNote = {Magnetic nanoparticles produced via nanoimprint lithography can change the current paradigm of fabrication processes from chemical “bottom-up” synthesis to “top-down” fabrication. The combination of controlled nondirectional magnetron sputtering, ETFE mold, bilayer lift-off, and dry etching release can control the shape, size, and structure of the fabricated nanoparticles. The resulting magnetic nanoparticles have a novel “sombrero” shape with complex and unique physical/magnetic properties.},
doi = {10.1002/admi.201400511},
journal = {Advanced Materials Interfaces},
number = 3,
volume = 2,
place = {United States},
year = {Sat Jan 10 00:00:00 EST 2015},
month = {Sat Jan 10 00:00:00 EST 2015}
}