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Title: Asymmetric band offsets in silicon heterojunction solar cells: Impact on device performance

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4959988· OSTI ID:1278695
 [1];  [2];  [3];  [3];  [2];  [1];  [1]
  1. Photovoltaics and Thin-Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Neuchatel (Switzerland)
  2. Yildiz Technical University, Istanbul (Turkey). Dept. of Physics
  3. CSEM, PV-Center, Neuchatel (Switzerland)

Amorphous/crystalline silicon interfaces feature considerably larger valence than conduction band offsets. In this article, we analyze the impact of such band offset asymmetry on the performance of silicon heterojunction solar cells. To this end, we use silicon suboxides as passivation layers—inserted between substrate and (front or rear) contacts—since such layers enable intentionally exacerbated band-offset asymmetry. Investigating all topologically possible passivation layer permutations and focussing on light and dark current-voltage characteristics, we confirm that to avoid fill factor losses, wider-bandgap siliconoxide films (of at least several nanometer thin) should be avoided in hole-collecting contacts. As a consequence, device implementation of such films as window layers—without degraded carrier collection—demands electron collection at the front and hole collection at the rear. Furthermore, at elevated operating temperatures, once possible carrier transport barriers are overcome by thermionic (field) emission, the device performance is mainly dictated by the passivation of its surfaces. In this context, compared to the standard amorphous silicon layers, the wide-bandgap oxide layers applied here passivate remarkably better at these temperatures, which may represent an additional benefit under practical operation conditions.

Research Organization:
Ecole Polytechnique Federale de Lausanne (Switzerland)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
Grant/Contract Number:
EE0006335
OSTI ID:
1278695
Alternate ID(s):
OSTI ID: 1279021; OSTI ID: 1354906
Journal Information:
Journal of Applied Physics, Vol. 120, Issue 5; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 15 works
Citation information provided by
Web of Science

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Cited By (3)

Sonochemical Modification of SiGe Layers for Photovoltaic Applications journal July 2019
Enhanced photoresponse of Ge/Si nanostructures by combining amorphous silicon deposition and annealing journal September 2018
Photoelectric Properties of SiGe Films Covered with Amorphous- and Polycrystalline-Silicon Layers journal June 2019