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Title: High temperature Hall measurement setup for thin film characterization

ORCiD logo [1];  [1]; ORCiD logo [1]
  1. Electrical and Computer Engineering, University of Connecticut, Storrs, Connecticut 06269, USA
Publication Date:
Sponsoring Org.:
OSTI Identifier:
Grant/Contract Number:
FG02-10ER46774; SC0005038
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 87; Journal Issue: 7; Related Information: CHORUS Timestamp: 2017-09-11 20:47:46; Journal ID: ISSN 0034-6748
American Institute of Physics
Country of Publication:
United States

Citation Formats

Adnane, L., Gokirmak, A., and Silva, H. High temperature Hall measurement setup for thin film characterization. United States: N. p., 2016. Web. doi:10.1063/1.4959222.
Adnane, L., Gokirmak, A., & Silva, H. High temperature Hall measurement setup for thin film characterization. United States. doi:10.1063/1.4959222.
Adnane, L., Gokirmak, A., and Silva, H. 2016. "High temperature Hall measurement setup for thin film characterization". United States. doi:10.1063/1.4959222.
title = {High temperature Hall measurement setup for thin film characterization},
author = {Adnane, L. and Gokirmak, A. and Silva, H.},
abstractNote = {},
doi = {10.1063/1.4959222},
journal = {Review of Scientific Instruments},
number = 7,
volume = 87,
place = {United States},
year = 2016,
month = 7

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1063/1.4959222

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