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Title: Low Voltage E-Beam Diagnostics.

Abstract

Abstract not provided.

Authors:
; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Laboratories, Livermore, CA
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1267176
Report Number(s):
SAND2007-1237C
526712
DOE Contract Number:
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the Welding JOWOG held March 6-8, 2007 in Los Alamos, NM.
Country of Publication:
United States
Language:
English

Citation Formats

Puskar, Joseph D., Gibbs, Gordon R., and Campiotti, Richard. Low Voltage E-Beam Diagnostics.. United States: N. p., 2007. Web.
Puskar, Joseph D., Gibbs, Gordon R., & Campiotti, Richard. Low Voltage E-Beam Diagnostics.. United States.
Puskar, Joseph D., Gibbs, Gordon R., and Campiotti, Richard. Thu . "Low Voltage E-Beam Diagnostics.". United States. doi:. https://www.osti.gov/servlets/purl/1267176.
@article{osti_1267176,
title = {Low Voltage E-Beam Diagnostics.},
author = {Puskar, Joseph D. and Gibbs, Gordon R. and Campiotti, Richard},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Feb 01 00:00:00 EST 2007},
month = {Thu Feb 01 00:00:00 EST 2007}
}

Conference:
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  • Single layer coatings of hafnia are included with results obtained with titania, tantala, zirconia and silica. These coatings were deposited by a reactive low voltage ion plating (RLVIP) and conventional reactive e-beam process. Layer thicknesses were optically a {lambda}/4 at 532 nm. The RMS surface roughness changes between the uncoated and coated were on the sub-angstrom level. The spectral transmittance curves demonstrated the material thickness homogeneity aspect of the RLVIP process. Laser damage thresholds were made from high peak power (1.06 {mu}m and 0.532 {mu}m, 10 ns) and high average power (511 nm and 578 nm) laser damage test facilities.more » Given a set of coatings from one process, the damage thresholds tended to increase as the refractive index decreased. The e-beam silica coating had the highest damage threshold, exceeding 98 J/cm{sup 2} (1.06 {mu}m, 10 ns, 10 Hz). In addition, the surface absorption and refractive indices of the coatings were measured, and the X-ray diffraction patterns of the hafnia coatings made.« less
  • Single layer coatings of hafnia are included with results obtained with titania, tantala, zirconia and silica. These coatings were deposited by a reactive low voltage ion plating (RLVIP) and conventional reactive e-beam process. Layer thicknesses were optically a {lambda}/4 at 532 nm. The RMS surface roughness changes between the uncoated and coated were on the sub-angstrom level. The spectral transmittance curves demonstrated the material thickness homogeneity aspect of the RLVIP process. Laser damage thresholds were made from high peak power (1.06 {mu}m and 0.532 {mu}m, 10 ns) and high average power (511 nm and 578 nm) laser damage test facilities.more » Given a set of coatings from one process, the damage thresholds tended to increase as the refractive index decreased. The e-beam silica coating had the highest damage threshold, exceeding 98 J/cm{sup 2} (1.06 {mu}m, 10 ns, 10 Hz). In addition, the surface absorption and refractive indices of the coatings were measured, and the X-ray diffraction patterns of the hafnia coatings made.« less
  • It is well established that pulsed power technology is relatively cheaper than other architectures aiming to produce high-current, high-voltage electron or ion accelerators. The footprints of most pulsed power accelerators are large making them incompatible for applications that require either portability or a large number of similar components for very high power devices (like Z-pinch accelerators). Most of the modern pulsed power accelerators require several stages of pulse conditioning (pulse forming) to convert the multimicrosecond pulse of a Marx generator output to the 50-1 00-ns pulse required for an electron or ion diode or a cell cavity of an inductivemore » voltage adder We propose a new and unique method for constmcting high-current, high-voltage pulsed accelerators. The salient future of the approach is switching and inductively adding the pulses at low voltage straight out of the capacitors through low inductance transfer and soft iron core isolation. High currents can be achieved by feeding each core with many capacitors connected in parallel in a circular array. High voltage is obtained by inductively adding many stages in series. Utilizing the presently available capacitors and switches we can build a 300-kA, 7-MV generator with an overall outer diameter (including capacitors and switches) of 1.2 m and length of 6.5 m! In addition our accelerator can be multipulsed with a repetition rate up to the capacitor specifications and no less than 10 Hz. As an example the design of a 3-MeV, 100-kA accelerator is presented and analyzed.« less
  • We present the results of our measurements of the electron cloud density in the PEP-II low energy ring (LER) by propagating a TE wave into the beam pipe. By connecting a signal generator to a beam position monitor button we can excite a signal above the vacuum chamber cut-off frequency and measure its propagation through the beam pipe with a spectrum analyzer connected to another button about 50 meters away. The measurement can be performed with different beam conditions and also at different settings of the solenoids used to reduce the build up of electrons. The presence of a modulationmore » in the TE wave transmission, synchronous with the beam revolution frequency, which appear to increase in depth when the solenoids are switched off, seem to be directly correlated to the electron cloud density in the region between the two BPM's. In this paper we present and discuss the measurements taken in the Interaction Region 12 straight of the LER during 2006 and the first part of 2007.« less