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Title: Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors

Authors:
 [1];  [1];  [2]
  1. Sinmat Inc., Gainesville, FL (United States)
  2. The Ohio State Univ., Columbus, OH (United States)
Publication Date:
Research Org.:
Sinmat Inc., Gainesville, FL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1266320
Report Number(s):
Final Report DOE SC-0007740
DOE Contract Number:  
SC0007740
Type / Phase:
SBIR
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; Diamond; Detectors; Chemical Mechanical Polishing

Citation Formats

Arjunan, Arul Chakkaravarthi, Singh, Rajiv, and Kagan, Harris. Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors. United States: N. p., 2016. Web.
Arjunan, Arul Chakkaravarthi, Singh, Rajiv, & Kagan, Harris. Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors. United States.
Arjunan, Arul Chakkaravarthi, Singh, Rajiv, and Kagan, Harris. Wed . "Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors". United States. doi:.
@article{osti_1266320,
title = {Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors},
author = {Arjunan, Arul Chakkaravarthi and Singh, Rajiv and Kagan, Harris},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jul 20 00:00:00 EDT 2016},
month = {Wed Jul 20 00:00:00 EDT 2016}
}

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