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Title: Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC

Authors:
 [1];  [1];  [2];  [2];  [2];  [1]
  1. University of Tennessee Space Institute (UTSI)
  2. ORNL
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1265673
DOE Contract Number:
AC05-00OR22725
Resource Type:
Conference
Resource Relation:
Conference: 227th ECS Meeting, Chicago, IL, USA, 20150524, 20150528
Country of Publication:
United States
Language:
English

Citation Formats

Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, and Zhang, Feng-Yuan. Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC. United States: N. p., 2015. Web.
Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, & Zhang, Feng-Yuan. Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC. United States.
Mo, Jingke, SteenIII, Stuart M, Retterer, Scott T, Cullen, David A, Terekhov, Alexander Y, and Zhang, Feng-Yuan. Thu . "Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC". United States. doi:.
@article{osti_1265673,
title = {Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC},
author = {Mo, Jingke and SteenIII, Stuart M and Retterer, Scott T and Cullen, David A and Terekhov, Alexander Y and Zhang, Feng-Yuan},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 2015},
month = {Thu Jan 01 00:00:00 EST 2015}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

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