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Title: Large-Scale All-Dielectric Metamaterial Perfect Reflectors

Abstract

All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. In this paper, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the reflectance of metallic mirrors. Moreover, the spectral separation of the electric and magnetic resonances can be chosen to achieve the required reflection bandwidth while maintaining a high tolerance to disorder. Finally, the scalability of this design could lead to new avenues of manipulating light for low-loss and large-area photonic applications.

Authors:
 [1];  [2];  [3];  [4];  [4];  [2];  [3]
  1. Vanderbilt Univ., Nashville, TN (United States). Interdisciplinary Materials Science Program
  2. SRI International, Menlo Park, CA (United States). Applied Optics Lab.
  3. Vanderbilt Univ., Nashville, TN (United States). Dept. of Mechanical Engineering
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org.:
USDOE Office of Science (SC); US Department of the Navy, Office of Naval Research (ONR)
Contributing Org.:
Vanderbilt Univ., Nashville, TN (United States); SRI International, Menlo Park, CA (United States)
OSTI Identifier:
1265550
Grant/Contract Number:  
AC05-00OR22725; N00014-14-1-0475; N00014-12-1-0722
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
ACS Photonics
Additional Journal Information:
Journal Volume: 2; Journal Issue: 6; Journal ID: ISSN 2330-4022
Publisher:
American Chemical Society (ACS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; all-dielectric metamaterial; Mie resonance; nanosphere lithography; perfect reflector

Citation Formats

Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., and Valentine, Jason. Large-Scale All-Dielectric Metamaterial Perfect Reflectors. United States: N. p., 2015. Web. doi:10.1021/acsphotonics.5b00148.
Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., & Valentine, Jason. Large-Scale All-Dielectric Metamaterial Perfect Reflectors. United States. https://doi.org/10.1021/acsphotonics.5b00148
Moitra, Parikshit, Slovick, Brian A., li, Wei, Kravchencko, Ivan I., Briggs, Dayrl P., Krishnamurthy, S., and Valentine, Jason. 2015. "Large-Scale All-Dielectric Metamaterial Perfect Reflectors". United States. https://doi.org/10.1021/acsphotonics.5b00148. https://www.osti.gov/servlets/purl/1265550.
@article{osti_1265550,
title = {Large-Scale All-Dielectric Metamaterial Perfect Reflectors},
author = {Moitra, Parikshit and Slovick, Brian A. and li, Wei and Kravchencko, Ivan I. and Briggs, Dayrl P. and Krishnamurthy, S. and Valentine, Jason},
abstractNote = {All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. In this paper, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the reflectance of metallic mirrors. Moreover, the spectral separation of the electric and magnetic resonances can be chosen to achieve the required reflection bandwidth while maintaining a high tolerance to disorder. Finally, the scalability of this design could lead to new avenues of manipulating light for low-loss and large-area photonic applications.},
doi = {10.1021/acsphotonics.5b00148},
url = {https://www.osti.gov/biblio/1265550}, journal = {ACS Photonics},
issn = {2330-4022},
number = 6,
volume = 2,
place = {United States},
year = {Fri May 08 00:00:00 EDT 2015},
month = {Fri May 08 00:00:00 EDT 2015}
}

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Cited by: 242 works
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Enhanced absorption in all-dielectric metasurfaces due to magnetic dipole excitation
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  • Slovick, Brian A.; Zhou, You; Yu, Zhi Gang
  • Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, Vol. 375, Issue 2090
  • https://doi.org/10.1098/rsta.2016.0072

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