Effect of interfacial structures on spin dependent tunneling in epitaxial L10-FePt/MgO/FePt perpendicular magnetic tunnel junctions
- Chinese Academy of Sciences (CAS), Beijing (China). State Key Lab. of Magnetism. Beijing National Lab. for Condensed Matter Physics. Inst. of Physics
- Univ. of Oxford (United Kingdom). Clarendon Lab. Dept. of Physics
- Ben-Gurion Univ. of the Negev, Beer-Sheva (Israel). Dept. of Materials Engineering. Ilse Katz Inst. for Nanoscale Science and Technology
- Univ. of Florida, Gainesville, FL (United States). Dept. of Physics. Quantum Theory Project; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences. Computer Science and Mathematics Division
In this study, epitaxial FePt(001)/MgO/FePt magnetic tunnel junctions with L10-FePt electrodes showing perpendicular magnetic anisotropy were fabricated by molecular beam epitaxial growth. Tunnel magnetoresistance ratios of 21% and 53% were obtained at 300 K and 10 K, respectively. Our previous work, based on transmission electron microscopy, confirmed a semi-coherent interfacial structure with atomic steps (Kohn et al., APL 102, 062403 (2013)). Here, we show by x-ray photoemission spectroscopy and first-principles calculation that the bottom FePt/MgO interface is either Pt-terminated for regular growth or when an Fe layer is inserted at the interface, it is chemically bonded to O. Finally, both these structures have a dominant role in spin dependent tunneling across the MgO barrier resulting in a decrease of the tunneling magnetoresistance ratio compared with previous predictions.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE
- Contributing Organization:
- Chinese Academy of Sciences (CAS), Beijing (China); Ben-Gurion Univ. of the Negev, Beer-Sheva (Israel)
- OSTI ID:
- 1265531
- Journal Information:
- Journal of Applied Physics, Vol. 117, Issue 8; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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