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Methods and apparatus for use with extreme ultraviolet light having contamination protection

Patent ·
OSTI ID:1261608
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An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
9,389,180
Application Number:
14/176,587
OSTI ID:
1261608
Country of Publication:
United States
Language:
English

References (3)

Nanoparticle Knudsen layers in gas-filled microscale geometries journal March 2008
Nonzero-Concentration Boundary Condition for Advection-Diffusion Aerosol-Transport Modeling journal August 2008
An approach for simulating the transport of spherical particles in a rarefied gas flow via the direct simulation Monte Carlo method journal November 2001

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