X-ray metrology and performance of a 45-cm long x-ray deformable mirror

Poyneer, Lisa A.; Brejnholt, Nicolai F.; Hill, Randall; Jackson, Jessie; Hagler, Lisle; Celestre, Richard; Feng, Jun

doi:10.1063/1.4950739

Title: X-ray metrology and performance of a 45-cm long x-ray deformable mirror

Journal Article · Fri May 20 00:00:00 EDT 2016 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4950739· OSTI ID:1260489

Poyneer, Lisa A. ^[1];

^[1]; Hill, Randall ^[1]; Jackson, Jessie ^[1]; Hagler, Lisle ^[1]; Celestre, Richard ^[2];

^[2]

Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)

We describe experiments with a 45-cm long x-ray deformable mirror (XDM) that have been conducted in End Station 2, Beamline 5.3.1 at the Advanced Light Source. A detailed description of the hardware implementation is provided. We explain our one-dimensional Fresnel propagation code that correctly handles grazing incidence and includes a model of the XDM. This code is used to simulate and verify experimental results. Initial long trace profiler metrology of the XDM at 7.5 keV is presented. The ability to measure a large (150-nm amplitude) height change on the XDM is demonstrated. The results agree well with the simulated experiment at an error level of 1 μrad RMS. Direct imaging of the x-ray beam also shows the expected change in intensity profile at the detector.

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Research Organization:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC52-07NA27344; AC02-05CH11231

OSTI ID:: 1260489

Alternate ID(s):: OSTI ID: 1440927

Report Number(s):: LLNL-JRNL-678726; RSINAK

Journal Information:: Review of Scientific Instruments, Vol. 87, Issue 5; ISSN 0034-6748

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 4 works

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Cited By (2)

Non-contact XUV metrology of Ru/B ₄ C multilayer optics by means of Hartmann wavefront analysis Ruiz-Lopez, Mabel; Dacasa, Hugo; Mahieu, Benoit Applied Optics, Vol. 57, Issue 6 https://doi.org/10.1364/ao.57.001315	journal	January 2018
Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis Ruiz-Lopez, Mabel; Dacasa, Hugo; Mahieu, Benoit arXiv https://doi.org/10.48550/arxiv.1806.10664	text	January 2018

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