skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Rapid self-assembly of block copolymers to photonic crystals

Abstract

The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.

Inventors:
; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
CALIFORNIA INSTITUTE OF TECHNOLOGY, Pasadena, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1260251
Patent Number(s):
9,382,387
Application Number:
13/800,646
Assignee:
CALIFORNIA INSTITUTE OF TECHNOLOGY (Pasadena, CA) CHO
DOE Contract Number:
FG02-05ER46218
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Mar 13
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Xia, Yan, Sveinbjornsson, Benjamin R, Grubbs, Robert H, Weitekamp, Raymond, Miyake, Garret M, Atwater, Harry A, Piunova, Victoria, Daeffler, Christopher Scot, Hong, Sung Woo, Gu, Weiyin, and Russell, Thomas P. Rapid self-assembly of block copolymers to photonic crystals. United States: N. p., 2016. Web.
Xia, Yan, Sveinbjornsson, Benjamin R, Grubbs, Robert H, Weitekamp, Raymond, Miyake, Garret M, Atwater, Harry A, Piunova, Victoria, Daeffler, Christopher Scot, Hong, Sung Woo, Gu, Weiyin, & Russell, Thomas P. Rapid self-assembly of block copolymers to photonic crystals. United States.
Xia, Yan, Sveinbjornsson, Benjamin R, Grubbs, Robert H, Weitekamp, Raymond, Miyake, Garret M, Atwater, Harry A, Piunova, Victoria, Daeffler, Christopher Scot, Hong, Sung Woo, Gu, Weiyin, and Russell, Thomas P. 2016. "Rapid self-assembly of block copolymers to photonic crystals". United States. doi:. https://www.osti.gov/servlets/purl/1260251.
@article{osti_1260251,
title = {Rapid self-assembly of block copolymers to photonic crystals},
author = {Xia, Yan and Sveinbjornsson, Benjamin R and Grubbs, Robert H and Weitekamp, Raymond and Miyake, Garret M and Atwater, Harry A and Piunova, Victoria and Daeffler, Christopher Scot and Hong, Sung Woo and Gu, Weiyin and Russell, Thomas P.},
abstractNote = {The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2016,
month = 7
}

Patent:

Save / Share:
  • Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
  • Pattern generation of well-controlled block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. In this paper, we used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high χ. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using themore » mixed solvents. Finally, this practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications.« less
  • Block copolymer (BCP) derived periodic nanostructures with domain sizes larger than 150 nm present a versatile platform for the fabrication of photonic materials. So far, the access to such materials has been limited to highly synthetically involved protocols. Herein, we report a simple, “user-friendly” method for the preparation of ultrahigh molecular weight linear poly(solketal methacrylate-b-styrene) block copolymers by a combination of Cu-wire-mediated ATRP and RAFT polymerizations. The synthesized copolymers with molecular weights up to 1.6 million g/mol and moderate dispersities readily assemble into highly ordered cylindrical or lamella microstructures with domain sizes as large as 292 nm, as determined bymore » ultra-small-angle x-ray scattering and scanning electron microscopy analyses. Solvent cast films of the synthesized block copolymers exhibit stop bands in the visible spectrum correlated to their domain spacings. The described method opens new avenues for facilitated fabrication and the advancement of fundamental understanding of BCP-derived photonic nanomaterials for a variety of applications.« less