Rapid self-assembly of block copolymers to photonic crystals

Xia, Yan; Sveinbjornsson, Benjamin R; Grubbs, Robert H; Weitekamp, Raymond; Miyake, Garret M; Atwater, Harry A; Piunova, Victoria; Daeffler, Christopher Scot; Hong, Sung Woo; Gu, Weiyin; Russell, Thomas P.

Rapid self-assembly of block copolymers to photonic crystals

Patent · 05 July 2016

OSTI ID:1260251

Xia, Yan; Sveinbjornsson, Benjamin R; Grubbs, Robert H; Weitekamp, Raymond; Miyake, Garret M; Atwater, Harry A; Piunova, Victoria; Daeffler, Christopher Scot; Hong, Sung Woo; Gu, Weiyin; Russell, Thomas P.

The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.

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Research Organization:: CALIFORNIA INSTITUTE OF TECHNOLOGY, Pasadena, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-05ER46218

Assignee:: CALIFORNIA INSTITUTE OF TECHNOLOGY (Pasadena, CA)

Patent Number(s):: 9,382,387

Application Number:: 13/800,646

OSTI ID:: 1260251

Country of Publication:: United States

Language:: English

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