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Title: Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

Abstract

Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversiblemore » loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination« less

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (US)
Sponsoring Org.:
USDOE Office of Defense Programs (DP) (US)
OSTI Identifier:
12565
Report Number(s):
UCRL-JC-132916
TRN: AH200120%%312
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: Society of Photo-Optical Instrumentation Engineers, 44th Annual Meeting of the International Symposium Optical Science, Engineering, and Instrumentation, Denver, CO (US), 07/18/1999--07/23/1999; Other Information: PBD: 5 Aug 1999
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; EXTREME ULTRAVIOLET RADIATION; DEPOSITION; INTEGRATED CIRCUITS; OXIDATION; REFLECTIVE COATINGS; STABILITY; SURFACE CONTAMINATION; SERVICE LIFE; MOLYBDENUM; SILICON; BERYLLIUM

Citation Formats

Bajt, S, Clift, W M, Folta, J A, Gullikson, E M, Klebanoff, L E, Kleineberg, U, Malinowski, M E, and Wedowski, M. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography. United States: N. p., 1999. Web.
Bajt, S, Clift, W M, Folta, J A, Gullikson, E M, Klebanoff, L E, Kleineberg, U, Malinowski, M E, & Wedowski, M. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography. United States.
Bajt, S, Clift, W M, Folta, J A, Gullikson, E M, Klebanoff, L E, Kleineberg, U, Malinowski, M E, and Wedowski, M. Thu . "Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/12565.
@article{osti_12565,
title = {Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography},
author = {Bajt, S and Clift, W M and Folta, J A and Gullikson, E M and Klebanoff, L E and Kleineberg, U and Malinowski, M E and Wedowski, M},
abstractNote = {Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {8}
}

Conference:
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