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Title: Uniform deposition of uranium hexafluoride (UF6): Standardized mass deposits and controlled isotopic ratios using a thermal fluorination method

Abstract

Abstract: We report a convenient method for the generation of volatile uranium hexafluoride (UF6) from solid uranium oxides and other uranium compounds, followed by uniform deposition of low levels of UF6 onto sampling coupons. Under laminar flow conditions, UF6 is shown to interact with surfaces within the chamber to a highly predictable degree. We demonstrate the preparation of uranium deposits that range between ~0.01 and 470±34 ng∙cm-2. The data suggest the method can be extended to creating depositions at the sub-picogram∙cm-2 level. Additionally, the isotopic composition of the deposits can be customized by selection of the uranium source materials. We demonstrate a layering technique whereby two uranium solids, each with a different isotopic composition, are employed to form successive layers of UF6 on a surface. The result is an ultra-thin deposit of UF6 that bears an isotopic signature that is a composite of the two uranium sources. The reported deposition method has direct application to the development of unique analytical standards for nuclear safeguards and forensics.

Authors:
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Publication Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA), Office of Defense Nuclear Nonproliferation (NA-20)
OSTI Identifier:
1255390
Report Number(s):
PNNL-SA-109983
Journal ID: ISSN 0039-9140; 400403909
DOE Contract Number:
AC05-76RL01830
Resource Type:
Journal Article
Resource Relation:
Journal Name: Talanta (Oxford); Journal Volume: 154
Country of Publication:
United States
Language:
English
Subject:
uranium oxide; uranium hexafluoride; thermo gravimetric; fluorination; nitrogen trifluoride

Citation Formats

McNamara, Bruce K., O’Hara, Matthew J., Casella, Andrew M., Carter, Jennifer C., Addleman, R. Shane, and MacFarlan, Paul J. Uniform deposition of uranium hexafluoride (UF6): Standardized mass deposits and controlled isotopic ratios using a thermal fluorination method. United States: N. p., 2016. Web. doi:10.1016/j.talanta.2016.03.054.
McNamara, Bruce K., O’Hara, Matthew J., Casella, Andrew M., Carter, Jennifer C., Addleman, R. Shane, & MacFarlan, Paul J. Uniform deposition of uranium hexafluoride (UF6): Standardized mass deposits and controlled isotopic ratios using a thermal fluorination method. United States. doi:10.1016/j.talanta.2016.03.054.
McNamara, Bruce K., O’Hara, Matthew J., Casella, Andrew M., Carter, Jennifer C., Addleman, R. Shane, and MacFarlan, Paul J. Fri . "Uniform deposition of uranium hexafluoride (UF6): Standardized mass deposits and controlled isotopic ratios using a thermal fluorination method". United States. doi:10.1016/j.talanta.2016.03.054.
@article{osti_1255390,
title = {Uniform deposition of uranium hexafluoride (UF6): Standardized mass deposits and controlled isotopic ratios using a thermal fluorination method},
author = {McNamara, Bruce K. and O’Hara, Matthew J. and Casella, Andrew M. and Carter, Jennifer C. and Addleman, R. Shane and MacFarlan, Paul J.},
abstractNote = {Abstract: We report a convenient method for the generation of volatile uranium hexafluoride (UF6) from solid uranium oxides and other uranium compounds, followed by uniform deposition of low levels of UF6 onto sampling coupons. Under laminar flow conditions, UF6 is shown to interact with surfaces within the chamber to a highly predictable degree. We demonstrate the preparation of uranium deposits that range between ~0.01 and 470±34 ng∙cm-2. The data suggest the method can be extended to creating depositions at the sub-picogram∙cm-2 level. Additionally, the isotopic composition of the deposits can be customized by selection of the uranium source materials. We demonstrate a layering technique whereby two uranium solids, each with a different isotopic composition, are employed to form successive layers of UF6 on a surface. The result is an ultra-thin deposit of UF6 that bears an isotopic signature that is a composite of the two uranium sources. The reported deposition method has direct application to the development of unique analytical standards for nuclear safeguards and forensics.},
doi = {10.1016/j.talanta.2016.03.054},
journal = {Talanta (Oxford)},
number = ,
volume = 154,
place = {United States},
year = {Fri Jul 01 00:00:00 EDT 2016},
month = {Fri Jul 01 00:00:00 EDT 2016}
}