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Title: Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation

Authors:
 [1]; ORCiD logo [2];  [3]; ORCiD logo [1];  [2];  [2]; ORCiD logo [4];  [1];  [5]
  1. Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA
  2. Department of Physics, University of Konstanz, 78457 Konstanz, Germany
  3. Institute for Solar Energy Research Hamelin (ISFH), 31860 Emmerthal, Germany
  4. Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA, Instituto de Energía Solar, Universidad Politécnica de Madrid, 28040 Madrid, Spain
  5. Department of Solar Energy, Institute of Solid-State Physics, University of Hannover, 30167 Hannover, Germany
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1253075
Grant/Contract Number:  
EE0006335
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 119 Journal Issue: 18; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Wagner, Hannes, Dastgheib-Shirazi, Amir, Min, Byungsul, Morishige, Ashley E., Steyer, Michael, Hahn, Giso, del Cañizo, Carlos, Buonassisi, Tonio, and Altermatt, Pietro P.. Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation. United States: N. p., 2016. Web. doi:10.1063/1.4949326.
Wagner, Hannes, Dastgheib-Shirazi, Amir, Min, Byungsul, Morishige, Ashley E., Steyer, Michael, Hahn, Giso, del Cañizo, Carlos, Buonassisi, Tonio, & Altermatt, Pietro P.. Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation. United States. doi:10.1063/1.4949326.
Wagner, Hannes, Dastgheib-Shirazi, Amir, Min, Byungsul, Morishige, Ashley E., Steyer, Michael, Hahn, Giso, del Cañizo, Carlos, Buonassisi, Tonio, and Altermatt, Pietro P.. Fri . "Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation". United States. doi:10.1063/1.4949326.
@article{osti_1253075,
title = {Optimizing phosphorus diffusion for photovoltaic applications: Peak doping, inactive phosphorus, gettering, and contact formation},
author = {Wagner, Hannes and Dastgheib-Shirazi, Amir and Min, Byungsul and Morishige, Ashley E. and Steyer, Michael and Hahn, Giso and del Cañizo, Carlos and Buonassisi, Tonio and Altermatt, Pietro P.},
abstractNote = {},
doi = {10.1063/1.4949326},
journal = {Journal of Applied Physics},
number = 18,
volume = 119,
place = {United States},
year = {Fri May 13 00:00:00 EDT 2016},
month = {Fri May 13 00:00:00 EDT 2016}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1063/1.4949326

Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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Works referenced in this record:

Silver thick-film contacts on highly doped n-type silicon emitters: Structural and electronic properties of the interface
journal, March 2003

  • Ballif, C.; Huljić, D. M.; Willeke, G.
  • Applied Physics Letters, Vol. 82, Issue 12, p. 1878-1880
  • DOI: 10.1063/1.1562338