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Title: Objective for EUV microscopy, EUV lithography, and x-ray imaging

Abstract

Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

Inventors:
; ;
Publication Date:
Research Org.:
Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1250448
Patent Number(s):
9,329,487
Application Number:
14/465,404
Assignee:
Bitter; Manfred (Princeton, NJ) PPPL
DOE Contract Number:  
AC02-09CH11466
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Aug 21
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS

Citation Formats

Bitter, Manfred, Hill, Kenneth W., and Efthimion, Philip. Objective for EUV microscopy, EUV lithography, and x-ray imaging. United States: N. p., 2016. Web.
Bitter, Manfred, Hill, Kenneth W., & Efthimion, Philip. Objective for EUV microscopy, EUV lithography, and x-ray imaging. United States.
Bitter, Manfred, Hill, Kenneth W., and Efthimion, Philip. Tue . "Objective for EUV microscopy, EUV lithography, and x-ray imaging". United States. https://www.osti.gov/servlets/purl/1250448.
@article{osti_1250448,
title = {Objective for EUV microscopy, EUV lithography, and x-ray imaging},
author = {Bitter, Manfred and Hill, Kenneth W. and Efthimion, Philip},
abstractNote = {Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue May 03 00:00:00 EDT 2016},
month = {Tue May 03 00:00:00 EDT 2016}
}

Patent:

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