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Title: In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

Abstract

In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.

Authors:
 [1]; ORCiD logo [2];  [3];  [3];  [3]; ORCiD logo [1];  [1]
  1. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA
  2. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
  3. Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1249441
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 87; Journal Issue: 1; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
73 NUCLEAR PHYSICS AND RADIATION PHYSICS

Citation Formats

Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., and Hong, Hawoong. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy. United States: N. p., 2016. Web. doi:10.1063/1.4939100.
Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., & Hong, Hawoong. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy. United States. doi:10.1063/1.4939100.
Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., and Hong, Hawoong. Fri . "In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy". United States. doi:10.1063/1.4939100.
@article{osti_1249441,
title = {In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy},
author = {Lee, J. H. and Tung, I. C. and Chang, S. -H. and Bhattacharya, A. and Fong, D. D. and Freeland, J. W. and Hong, Hawoong},
abstractNote = {In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.},
doi = {10.1063/1.4939100},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 1,
volume = 87,
place = {United States},
year = {2016},
month = {1}
}

Works referenced in this record:

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journal, October 2014

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journal, July 2014


A six-circle diffractometer system for synchrotron X-ray studies of surfaces and thin film growth by molecular beam epitaxy
journal, March 2007

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Quantum Beating Patterns Observed in the Energetics of Pb Film Nanostructures
journal, July 2004


Quantum growth of a metal/insulator system: Lead on sapphire
journal, December 2010

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Reflection surface x-ray diffraction patterns: k -space images
journal, August 2000

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Real-Time Reciprocal Space Mapping of Nano-Islands Induced by Quantum Confinement
journal, June 2010

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Time-resolved reflection surface x-ray diffraction
journal, April 2002

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Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?
journal, January 2015

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Dynamic layer rearrangement during growth of layered oxide films by molecular beam epitaxy
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  • Nature Materials, Vol. 13, Issue 9
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Nonequilibrium Interlayer Transport in Pulsed Laser Deposition
journal, June 2006


Measurements of Surface Diffusivity and Coarsening during Pulsed Laser Deposition
journal, December 2009


    Works referencing / citing this record:

    FORTE – a multipurpose high-vacuum diffractometer for tender X-ray diffraction and spectroscopy at the SIRIUS beamline of Synchrotron SOLEIL
    journal, May 2019