In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

Lee, J. H.; Tung, I. C.; Chang, S. -H.; Bhattacharya, A.; Fong, D. D.; Freeland, J. W.; Hong, Hawoong

doi:10.1063/1.4939100

Title: In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

Journal Article · Fri Jan 01 00:00:00 EST 2016 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4939100· OSTI ID:1249441

Lee, J. H. ^[1];

^[2]; Chang, S. -H. ^[3]; Bhattacharya, A. ^[3]; Fong, D. D. ^[3];

^[1]; Hong, Hawoong ^[1]

Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA

In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC02-06CH11357

OSTI ID:: 1249441

Journal Information:: Review of Scientific Instruments, Vol. 87, Issue 1; ISSN 0034-6748

Publisher:: American Institute of Physics (AIP)

Country of Publication:: United States

Language:: English

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Picoscale materials engineering Ismail-Beigi, Sohrab; Walker, Frederick J.; Disa, Ankit S. Nature Reviews Materials, Vol. 2, Issue 11 https://doi.org/10.1038/natrevmats.2017.60	journal	September 2017
Development of a hybrid molecular beam epitaxy deposition system for in situ surface x-ray studies Andersen, Tassie K.; Cook, Seyoung; Benda, Erika Review of Scientific Instruments, Vol. 89, Issue 3 https://doi.org/10.1063/1.5008369	journal	March 2018
Polarity-driven oxygen vacancy formation in ultrathin ${LaNiO}_{3}$ films on ${SrTiO}_{3}$ Tung, I-Cheng; Luo, Guangfu; Lee, June Hyuk Physical Review Materials, Vol. 1, Issue 5 https://doi.org/10.1103/physrevmaterials.1.053404	journal	October 2017
Ultrahigh-vacuum organic molecular-beam deposition system for in situ growth and characterization Annese, Emilia; dos Santos, Joacir E.; Rodrigues, Gustavo Lorencini M. P. Journal of Synchrotron Radiation, Vol. 25, Issue 6 https://doi.org/10.1107/s1600577518011955	journal	September 2018
FORTE – a multipurpose high-vacuum diffractometer for tender X-ray diffraction and spectroscopy at the SIRIUS beamline of Synchrotron SOLEIL Ciatto, G.; Aubert, N.; Lecroard, M. Journal of Synchrotron Radiation, Vol. 26, Issue 4 https://doi.org/10.1107/s1600577519003722	journal	May 2019
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