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Title: Transmission electron microscopy investigation of Ag diffusion mechanisms in β-SiC

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Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Nuclear Materials
Additional Journal Information:
Journal Volume: 457; Journal Issue: C; Related Information: CHORUS Timestamp: 2017-07-04 09:16:51; Journal ID: ISSN 0022-3115
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Coward, Robert A., Winkler, Christopher R., Hanson, William A., Jablonski, Michael L., and Taheri, Mitra L. Transmission electron microscopy investigation of Ag diffusion mechanisms in β-SiC. Netherlands: N. p., 2015. Web. doi:10.1016/j.jnucmat.2014.11.116.
Coward, Robert A., Winkler, Christopher R., Hanson, William A., Jablonski, Michael L., & Taheri, Mitra L. Transmission electron microscopy investigation of Ag diffusion mechanisms in β-SiC. Netherlands. doi:10.1016/j.jnucmat.2014.11.116.
Coward, Robert A., Winkler, Christopher R., Hanson, William A., Jablonski, Michael L., and Taheri, Mitra L. 2015. "Transmission electron microscopy investigation of Ag diffusion mechanisms in β-SiC". Netherlands. doi:10.1016/j.jnucmat.2014.11.116.
title = {Transmission electron microscopy investigation of Ag diffusion mechanisms in β-SiC},
author = {Coward, Robert A. and Winkler, Christopher R. and Hanson, William A. and Jablonski, Michael L. and Taheri, Mitra L.},
abstractNote = {},
doi = {10.1016/j.jnucmat.2014.11.116},
journal = {Journal of Nuclear Materials},
number = C,
volume = 457,
place = {Netherlands},
year = 2015,
month = 2

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Free Publicly Available Full Text
Publisher's Version of Record at 10.1016/j.jnucmat.2014.11.116

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Cited by: 7works
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