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Title: Electrostatically defined silicon quantum dots with counted antimony donor implants

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4940421· OSTI ID:1237511
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  1. Sandia National Laboratories, Albuquerque, New Mexico 87185, USA, Center for Integrated Nanotechnologies, Sandia National Laboratories, Albuquerque, New Mexico 87175, USA
  2. Sandia National Laboratories, Albuquerque, New Mexico 87185, USA

Sponsoring Organization:
USDOE
OSTI ID:
1237511
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 108 Journal Issue: 6; ISSN 0003-6951
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 20 works
Citation information provided by
Web of Science

References (20)

Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities journal January 2012
Annealing of surface states in polycrystalline‐silicon–gate capacitors journal February 1977
A silicon-based nuclear spin quantum computer journal May 1998
Room-Temperature Quantum Bit Storage Exceeding 39 Minutes Using Ionized Donors in Silicon-28 journal November 2013
A single-atom electron spin qubit in silicon journal September 2012
Electronic stopping powers for heavy ions in SiC and SiO 2 journal January 2014
A reliable method for the counting and control of single ions for single-dopant controlled devices journal July 2008
Electrical activation and electron spin coherence of ultralow dose antimony implants in silicon journal March 2006
Quantum information and computation journal March 2000
Electron exchange coupling for single-donor solid-state spin qubits journal November 2003
Electron spin lifetime of a single antimony donor in silicon journal September 2013
Exchange in Silicon-Based Quantum Computer Architecture journal December 2001
Silicon planar technology for single-photon optical detectors journal April 2003
Single-shot readout of an electron spin in silicon journal September 2010
Room temperature single ion detection with Geiger mode avalanche diode detectors journal July 2008
Comparison between simulated and experimental Au-ion profiles implanted in nanocrystalline ceria journal July 2013
Controlled shallow single-ion implantation in silicon using an active substrate for sub-20‐keV ions journal May 2005
Single ion implantation for single donor devices using Geiger mode detectors journal January 2010
Detection of low energy single ion impacts in micron scale transistors at room temperature journal November 2007
Electron spin coherence exceeding seconds in high-purity silicon journal December 2011

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