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Title: Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors

Abstract

In this study, an improved method for measuring the cross sections for carrier trapping at defects in semiconductors is described. This method, a variation of deep level transient spectroscopy(DLTS) used with bipolar transistors, is applied to hot carrier trapping at vacancy-oxygen, carbon-oxygen, and three charge states of divacancy centers (V2) in n- and p-type silicon. Unlike standard DLTS, we fill traps by injecting carriers into the depletion region of a bipolar transistor diode using a pulse of forward bias current applied to the adjacent diode. We show that this technique is capable of accurately measuring a wide range of capture cross sections at varying electric fields due to the control of the carrier density it provides. Because this technique can be applied to a variety of carrier energy distributions, it should be valuable in modeling the effect of radiation-induced generation-recombination currents in bipolar devices.

Authors:
ORCiD logo [1];  [1];  [1];  [1]
  1. Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1239986
Alternate Identifier(s):
OSTI ID: 1228652
Report Number(s):
SAND-2015-5982J
Journal ID: ISSN 0021-8979; JAPIAU; 618345
Grant/Contract Number:  
AC04-94AL85000
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 118; Journal Issue: 1; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; deep level transient spectroscopy; electric fields; transistors; carrier density; charge injection

Citation Formats

Fleming, R. M., Seager, C. H., Lang, D. V., and Campbell, J. M. Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors. United States: N. p., 2015. Web. doi:10.1063/1.4923358.
Fleming, R. M., Seager, C. H., Lang, D. V., & Campbell, J. M. Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors. United States. https://doi.org/10.1063/1.4923358
Fleming, R. M., Seager, C. H., Lang, D. V., and Campbell, J. M. 2015. "Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors". United States. https://doi.org/10.1063/1.4923358. https://www.osti.gov/servlets/purl/1239986.
@article{osti_1239986,
title = {Injection deep level transient spectroscopy: An improved method for measuring capture rates of hot carriers in semiconductors},
author = {Fleming, R. M. and Seager, C. H. and Lang, D. V. and Campbell, J. M.},
abstractNote = {In this study, an improved method for measuring the cross sections for carrier trapping at defects in semiconductors is described. This method, a variation of deep level transient spectroscopy(DLTS) used with bipolar transistors, is applied to hot carrier trapping at vacancy-oxygen, carbon-oxygen, and three charge states of divacancy centers (V2) in n- and p-type silicon. Unlike standard DLTS, we fill traps by injecting carriers into the depletion region of a bipolar transistor diode using a pulse of forward bias current applied to the adjacent diode. We show that this technique is capable of accurately measuring a wide range of capture cross sections at varying electric fields due to the control of the carrier density it provides. Because this technique can be applied to a variety of carrier energy distributions, it should be valuable in modeling the effect of radiation-induced generation-recombination currents in bipolar devices.},
doi = {10.1063/1.4923358},
url = {https://www.osti.gov/biblio/1239986}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 1,
volume = 118,
place = {United States},
year = {Thu Jul 02 00:00:00 EDT 2015},
month = {Thu Jul 02 00:00:00 EDT 2015}
}

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Works referenced in this record:

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