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Title: Wall profile developments in through-mask electrochemical micromachining of invar alloy films

Journal Article · · Journal of the Electrochemical Society
DOI:https://doi.org/10.1149/1.2048678· OSTI ID:122727
; ;  [1]
  1. Seoul National Univ. (Korea, Republic of). Dept. of Mineral and Petroleum Engineering

The through-mask electrochemical micromachining of invar (Fe-36Ni) alloy film in 4M NaCl solution was carried out. Wall profile change during electrochemical etching was simulated using the boundary element method with assumptions of negligible concentration variation in the bulk solution and kinetic resistance at the electrode surface. The shape evolution with time was predicted and agreed well with the experimental values for small aspect ratio.

Sponsoring Organization:
USDOE
OSTI ID:
122727
Journal Information:
Journal of the Electrochemical Society, Vol. 142, Issue 9; Other Information: PBD: Sep 1995
Country of Publication:
United States
Language:
English

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