skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition

Authors:
 [1];  [2];  [3];  [4]; ORCiD logo [5];  [6];  [6];  [1];  [2]
  1. Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011, USA and Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA
  2. IFIMUP and IN-Institute of Nanoscience and Nanotechnology, Departamento de Física e Astronomia, da Faculdade de Ciências, da Universidade do Porto, Rua do Campo Alegre, 687, 4169-007 Porto, Portugal
  3. Blackett Laboratory, Imperial College, London SW7 2AZ, United Kingdom
  4. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA
  5. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA, Division of Materials Science and Engineering, Ames Laboratory, Ames, Iowa 50011, USA
  6. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1226697
Grant/Contract Number:  
AC02-07CH11358
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 106 Journal Issue: 3; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., and Araújo, Joao P. Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition. United States: N. p., 2015. Web. doi:10.1063/1.4906056.
Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., & Araújo, Joao P. Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition. United States. doi:10.1063/1.4906056.
Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., and Araújo, Joao P. Tue . "Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition". United States. doi:10.1063/1.4906056.
@article{osti_1226697,
title = {Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition},
author = {Hadimani, Ravi L. and Silva, Joao H. B. and Pereira, Andre M. and Schlagel, Devo L. and Lograsso, Thomas A. and Ren, Yang and Zhang, Xiaoyi and Jiles, David C. and Araújo, Joao P.},
abstractNote = {},
doi = {10.1063/1.4906056},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 3,
volume = 106,
place = {United States},
year = {2015},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1063/1.4906056

Citation Metrics:
Cited by: 9 works
Citation information provided by
Web of Science

Save / Share:

Works referenced in this record:

Recent developments in magnetocaloric materials
journal, May 2005

  • Gschneidner, K. A.; Pecharsky, V. K.; Tsokol, A. O.
  • Reports on Progress in Physics, Vol. 68, Issue 6, p. 1479-1539
  • DOI: 10.1088/0034-4885/68/6/R04

Large field-induced strains in a lead-free piezoelectric material
journal, January 2011

  • Zhang, J. X.; Xiang, B.; He, Q.
  • Nature Nanotechnology, Vol. 6, Issue 2, p. 98-102
  • DOI: 10.1038/nnano.2010.265

Giant Magnetocaloric Effect in Gd5(Si2Ge2)
journal, June 1997