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Title: Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
NREL Laboratory Directed Research and Development (LDRD)
Contributing Org.:
University of Arizona, Tucson, Arizona; University of Denver, Denver, Colorado; Colorado School of Mines, Golden, Colorado
OSTI Identifier:
1220683
Report Number(s):
NREL/JA-5K00-63806
Resource Type:
Journal Article
Journal Name:
Journal of Materials Chemistry A
Additional Journal Information:
Journal Volume: 3; Journal Issue: 20
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 36 MATERIALS SCIENCE; solar cell; bulk heterojunction; nickel oxide; organometallic precursor; XPS; FTIR; AFM; work function

Citation Formats

Steirer, Kenneth Xerxes, Richards, Robin, Sigdel, Ajaya, Garcia, Andres, Ndione, Paul, Hammond, Scott, Baker, Darick, Ratcliff, Erin L., Curtis, Calvin, Furtak, Tom, Ginley, David S., Olson, Dana C., Armstrong, Neal R., and Berry, Joseph J. Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance. United States: N. p., 2015. Web. doi:10.1039/C5TA01379H.
Steirer, Kenneth Xerxes, Richards, Robin, Sigdel, Ajaya, Garcia, Andres, Ndione, Paul, Hammond, Scott, Baker, Darick, Ratcliff, Erin L., Curtis, Calvin, Furtak, Tom, Ginley, David S., Olson, Dana C., Armstrong, Neal R., & Berry, Joseph J. Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance. United States. doi:10.1039/C5TA01379H.
Steirer, Kenneth Xerxes, Richards, Robin, Sigdel, Ajaya, Garcia, Andres, Ndione, Paul, Hammond, Scott, Baker, Darick, Ratcliff, Erin L., Curtis, Calvin, Furtak, Tom, Ginley, David S., Olson, Dana C., Armstrong, Neal R., and Berry, Joseph J. Thu . "Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance". United States. doi:10.1039/C5TA01379H.
@article{osti_1220683,
title = {Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance},
author = {Steirer, Kenneth Xerxes and Richards, Robin and Sigdel, Ajaya and Garcia, Andres and Ndione, Paul and Hammond, Scott and Baker, Darick and Ratcliff, Erin L. and Curtis, Calvin and Furtak, Tom and Ginley, David S. and Olson, Dana C. and Armstrong, Neal R. and Berry, Joseph J.},
abstractNote = {},
doi = {10.1039/C5TA01379H},
journal = {Journal of Materials Chemistry A},
number = 20,
volume = 3,
place = {United States},
year = {2015},
month = {5}
}