Maskless Lithography of Nanometer-Scale Circuit Structures in Supported, Single-Layer Graphene Using Helium Ion Microscopy
Conference
·
OSTI ID:1214498
- ORNL
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 1214498
- Resource Relation:
- Conference: TechConnect Nanotechnology, Washington, DC, USA, 20150615, 20150615
- Country of Publication:
- United States
- Language:
- English
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