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Title: Nano-Sculpting of Suspended CVD Graphene with Helium and Neon Ion Beams

 [1];  [1];  [1];  [2];  [2];  [2]
  1. ORNL
  2. Lockheed Martin Space Systems Company
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org.:
Work for Others (WFO); USDOE Office of Science (SC)
OSTI Identifier:
DOE Contract Number:
Resource Type:
Resource Relation:
Conference: Microscopy and Microanalysis, Portland, OR, USA, 20150802, 20150802
Country of Publication:
United States

Citation Formats

Cullen, David A, Swett, Jacob Louis L, Rondinone, Adam Justin, Bedworth, Peter, Heise, Scott, and Stinton, Steve. Nano-Sculpting of Suspended CVD Graphene with Helium and Neon Ion Beams. United States: N. p., 2015. Web.
Cullen, David A, Swett, Jacob Louis L, Rondinone, Adam Justin, Bedworth, Peter, Heise, Scott, & Stinton, Steve. Nano-Sculpting of Suspended CVD Graphene with Helium and Neon Ion Beams. United States.
Cullen, David A, Swett, Jacob Louis L, Rondinone, Adam Justin, Bedworth, Peter, Heise, Scott, and Stinton, Steve. 2015. "Nano-Sculpting of Suspended CVD Graphene with Helium and Neon Ion Beams". United States. doi:.
title = {Nano-Sculpting of Suspended CVD Graphene with Helium and Neon Ion Beams},
author = {Cullen, David A and Swett, Jacob Louis L and Rondinone, Adam Justin and Bedworth, Peter and Heise, Scott and Stinton, Steve},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2015,
month = 1

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  • Helium ion microscopy (HIM) was used for direct nano-patterning of single-layer graphene (SLG) on SiO{sub 2}/Si substrates. This technique involves irradiation of the sample with accelerated helium ions (He{sup +}). Doses of 2.0 × 10{sup 16 }He{sup + }cm{sup −2} from a 30 kV beam induced a metal-insulator transition in the SLG. The resolution of HIM patterning on SLG was investigated by fabricating nanoribbons and nanostructures. Analysis of scanning capacitance microscopy measurements revealed that the spatial resolution of HIM patterning depended on the dosage of He{sup +} in a non-monotonic fashion. Increasing the dose from 2.0 × 10{sup 16} to 5.0 × 10{sup 16 }He{sup + }cm{sup −2} improved the spatialmore » resolution to several tens of nanometers. However, doses greater than 1.0 × 10{sup 17 }He{sup + }cm{sup −2} degraded the patterning characteristics. Direct patterning using HIM is a versatile approach to graphene fabrication and can be applied to graphene-based devices.« less
  • Achieving the ultimate limits of materials and device performance necessitates the engineering of matter with atomic, molecular, and mesoscale fidelity. While common for organic and macromolecular chemistry, these capabilities are virtually absent for 2D materials. In contrast to the undesired effect of ion implantation from focused ion beam (FIB) lithography with gallium ions, and proximity effects in standard e-beam lithography techniques, the shorter mean free path and interaction volumes of helium and neon ions offer a new route for clean, resist free nanofabrication. Furthermore, with the advent of scanning helium ion microscopy, maskless He + and Ne + beam lithographymore » of graphene based nanoelectronics is coming to the forefront. Here, we will discuss the use of energetic Ne ions in engineering graphene devices and explore the mechanical, electromechanical and chemical properties of the ion-milled devices using scanning probe microscopy (SPM). By using SPM-based techniques such as band excitation (BE) force modulation microscopy, Kelvin probe force microscopy (KPFM) and Raman spectroscopy, we demonstrate that the mechanical, electrical and optical properties of the exact same devices can be quantitatively extracted. Additionally, the effect of defects inherent in ion beam direct-write lithography, on the overall performance of the fabricated devices is elucidated.« less
  • We report the fabrication of micro and nano-disks in single layer chemical vapor deposition graphene on glass substrate using femtosecond laser ablation with vortex Bessel beams. The fabricated graphene disks with diameters ranging from 650 nm to 4 μm were characterized by spatially resolved micro-Raman spectroscopy. The variation of ablation threshold was investigated as a function of the number of pulses showing an incubation effect. A very high degree of size control of the fabricated graphene disks is enabled using a sequence of femtosecond pulses with different vortex orders.
  • External reactor vessel cooling (ERVC) for in-vessel retention (IVR) of corium as a key severe accident management strategy can be achieved by flooding the reactor cavity during a severe accident. In this accident mitigation strategy, the decay heat removal capability depends on whether the imposed heat flux exceeds critical heat flux (CHF). To provide sufficient cooling for high-power reactors such as APR1400, there have been some R and D efforts to use the reactor vessel with micro-porous coating and nano-fluids boiling-induced coating. The dispersion stability of graphene-oxide nano-fluid in the chemical conditions of flooding water that includes boric acid, lithiummore » hydroxide (LiOH) and tri-sodium phosphate (TSP) was checked in terms of surface charge or zeta potential before the CHF experiments. Results showed that graphene-oxide nano-fluids were very stable under ERVC environment. The critical heat flux (CHF) on the reactor vessel external wall was measured using the small scale two-dimensional slide test section. The radius of the curvature is 0.1 m. The dimension of each part in the facility simulated the APR-1400. The heater was designed to produce the different heat flux. The magnitude of heat flux follows the one of the APR-1400 when the severe accident occurred. All tests were conducted under inlet subcooling 10 K. Graphene-oxide nano-fluids (concentration: 10 -4 V%) enhanced CHF limits up to about 20% at mass flux 50 kg/m{sup 2}s and 100 kg/m{sup 2}s in comparison with the results of the distilled water at same test condition. (authors)« less