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Title: A More Realistic Way of Stressing the End-to-end I/O System

 [1];  [1];  [1];  [1];  [1];  [1]
  1. ORNL
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Oak Ridge Leadership Computing Facility (OLCF)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
DOE Contract Number:
Resource Type:
Resource Relation:
Conference: Cray User Group 2015, Chicago, IL, USA, 20150426, 20150430
Country of Publication:
United States

Citation Formats

Vergara Larrea, Veronica G, Oral, H Sarp, Leverman, Dustin B, Nam, Hai Ah, Wang, Feiyi, and Simmons, James A. A More Realistic Way of Stressing the End-to-end I/O System. United States: N. p., 2015. Web.
Vergara Larrea, Veronica G, Oral, H Sarp, Leverman, Dustin B, Nam, Hai Ah, Wang, Feiyi, & Simmons, James A. A More Realistic Way of Stressing the End-to-end I/O System. United States.
Vergara Larrea, Veronica G, Oral, H Sarp, Leverman, Dustin B, Nam, Hai Ah, Wang, Feiyi, and Simmons, James A. 2015. "A More Realistic Way of Stressing the End-to-end I/O System". United States. doi:.
title = {A More Realistic Way of Stressing the End-to-end I/O System},
author = {Vergara Larrea, Veronica G and Oral, H Sarp and Leverman, Dustin B and Nam, Hai Ah and Wang, Feiyi and Simmons, James A},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2015,
month = 1

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