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Title: Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

Abstract

Atomic layer deposition ( ALD ) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide ( AAO ) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d 40 nm and pore length L 70 microns. The AAO membranes were coated by ALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD .

Authors:
; ; ; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1198444
Grant/Contract Number:
W-7405-Eng-48; W-31-109-ENG-38
Resource Type:
Journal Article: Published Article
Journal Name:
Journal of Nanomaterials
Additional Journal Information:
Journal Volume: 2006; Related Information: CHORUS Timestamp: 2016-08-11 11:56:41; Journal ID: ISSN 1687-4110
Publisher:
Hindawi Publishing Corporation
Country of Publication:
Egypt
Language:
English

Citation Formats

Elam, Jeffrey W., Xiong, Guang, Han, Catherine Y., Wang, H. Hau, Birrell, James P., Welp, Ulrich, Hryn, John N., Pellin, Michael J., Baumann, Theodore F., Poco, John F., and Satcher, Joe H. Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials. Egypt: N. p., 2006. Web. doi:10.1155/JNM/2006/64501.
Elam, Jeffrey W., Xiong, Guang, Han, Catherine Y., Wang, H. Hau, Birrell, James P., Welp, Ulrich, Hryn, John N., Pellin, Michael J., Baumann, Theodore F., Poco, John F., & Satcher, Joe H. Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials. Egypt. doi:10.1155/JNM/2006/64501.
Elam, Jeffrey W., Xiong, Guang, Han, Catherine Y., Wang, H. Hau, Birrell, James P., Welp, Ulrich, Hryn, John N., Pellin, Michael J., Baumann, Theodore F., Poco, John F., and Satcher, Joe H. Sun . "Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials". Egypt. doi:10.1155/JNM/2006/64501.
@article{osti_1198444,
title = {Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials},
author = {Elam, Jeffrey W. and Xiong, Guang and Han, Catherine Y. and Wang, H. Hau and Birrell, James P. and Welp, Ulrich and Hryn, John N. and Pellin, Michael J. and Baumann, Theodore F. and Poco, John F. and Satcher, Joe H.},
abstractNote = {Atomic layer deposition ( ALD ) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide ( AAO ) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d ∼ 40 nm and pore length L ∼ 70 microns. The AAO membranes were coated by ALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD .},
doi = {10.1155/JNM/2006/64501},
journal = {Journal of Nanomaterials},
number = ,
volume = 2006,
place = {Egypt},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1155/JNM/2006/64501

Citation Metrics:
Cited by: 30works
Citation information provided by
Web of Science

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